International Business Machines Corporation

Donald Clifford Hofer

Ratnam Sooriyakumaran

Gregory Michael Wallraff

Richard Anthony DiPietro

Willi Volksen

Hiroshi Ito

Gregory Breyta

Robert Dennis Miller

Robert David Allen

Phillip Joe Brock

Scott Arthur MacDonald

Vincent N Kahwaty

Jeffrey W Labadie

Carl R Valentino

Mahmoud M Khojasteh

Arpan Pravin Mahorowala

Sally Ann Swanson

Carlton G Willson

William Dinan Hinsberg

Robert J Twieg

Hiroyuki Hiraoka

Thomas Ingolf Wallow

James Lupton Hedrick

Nicholas J Clecak

James L Hedrick, Jr

Josef Michl

Costantino S Yannoni

Elwood Herbert Macy

Robert Bruce Prime

Juliann Opitz

Anthony F Arnold

Lester A Pederson

Raymond D Kendrick

Ying Ying Cheng

Prabodh R Shah

Debra B LaVergne

Richard D Diller, Deceased

Patricia M Cotts

Thomas Paul Russell

Polymerizable monomers having silicon containing groups that are transparent at 193 nm; and ethylenically unsaturated group are provided. Polymers from these monomers can be used in processes for forming sub-100 nm images with a chemically amplified, radiation sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation sensitive acid generator and (ii) an organic underlayer. The bilayer resist can be used in the manufacturing of integrated circuits.

High silicon content monomers and polymers suitable for 193 nm bilayer resists

A photoresist composition which includes hydroxycarborane either incorporated as a monomeric dissolution modifier or as pendent groups on a polymer backbone. The photoresist composition is particularly useful in a bilayer thin film imaging lithographic process in which ultraviolet radiation-imaging in a wavelength range of between about 365 nm and about 13 nm is employed.

Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography

The present invention relates to an improved lithographic imaging process for use in the manufacture of integrated circuits. The process provides protection to the photoresist film from airborne chemical contaminants.

Process for imaging of photoresist

The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.

Resist composition with radiation sensitive acid generator

The invention relates to a process for forming bilayer resist images with a chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation-sensitive acid generator and a vinyl polymer having an acid-cleavable silylethoxy group and (ii) an organic underlayer. The bilayer resist is used in the manufacture of integrated circuits.

Process for using bilayer photoresist

The present invention relates to an insulating foamed polymer having a pore size less than about 1000 .ANG. made from a copolymer comprising a matrix polymer and a thermally decomposable polymer by heating the copolymer above the decomposition temperature of the decomposable polymer.

Foamed polymer for use as dielectric material

Block copolymers of polyimide and poly (phenylquinoxaline) have been synthesized. They are useful, particularly as dielectric layers in thin film multilayer structures. The most preferred embodiments are formed from polyimides which are those from pyromellitic dianhydride and oxydianiline. The most preferred poly (phenylquinoxaline) is a monofunctional oligomer, which yields the best microstructure.

Polyimide-poly(phenylquinoxaline) block copolymers

A composition for the application of a planar polyimide coating having a glass transition temperature above 300.degree. C. comprises a solution in an anhydrous, aprotic solvent of an aromatic diamine and a dialkyldihydrogen pyromellitate which is more than 90% meta isomer.

Polyimide coating compositions based on meta-dialkyldihydrogen

A surface coating of high glass temperature and superior mechanical properties along with excellent planarization and gap filling is used to coat substrates. The coating comprises a polyamide alkyl ester from a pyromellitic alkyl diester and a para-linked aromatic diamine dissolved in a solvent containing at least 10% of a co-solvent boiling above 220.degree. C.

Process for planarizing a substrate

A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.

Process for making an imaged oxygen-reactive ion etch barrier

A method for line narrowing in nuclear magnetic resonance (NMR) studies in solids is described. The method employs quasi-continuous amplitude modulation of an rf field wherein the field is eliminated at intervals for short periods of time at or about the time when the amplitude for both the maximum and minimum approach zero, these intervals creating windows where the NMR signal can be observed.

Method for reducing homonuclear broadening in magnetic resonance spectra

An NMR (nuclear magnetic resonance) spectrometer has a permanent magnet provided with a field coil. A lock system cyclically pulses a deuterium lock sample to produce a FID (free induction decay) signal that is analyzed by measuring the time interval during which the FID signal crosses the zero axis a predetermined number of times. The measured interval is compared to a predetermined interval or set point, and the current through the field coil is adjusted in the direction tending to correct the field strength so as to maintain the measured interval equal to the preset interval. Such measurement, comparison and adjustment are done several times each second. When the sample is removed, the lock system retains the last field setting achieved with the sample.

NMR field frequency lock system

A method is described for the quantitative analysis of a solution in which the solvent produces a nuclear magnetic resonant (NMR) spectral peak that dominates the system. A first spectrum containing the peak is made by operation of a nuclear magnetic resonant spectrometer at a first gain setting. The NMR apparatus is a pulse-modulated, Fourier-transform type spectrometer. A second spectrum is produced in which a 180.degree. pulse is applied to invert the spectral component magnetization followed after a period of time by a 90.degree. pulse. The period of time is sufficient to allow the solvent or component producing the unwanted peak to relax from the inverted state to a point where there is minimum magnetization along the longitudinal axis. At this point, in many solutions the other components have completely relaxed so that the 90.degree. pulse produces a free induction decay signal which, after undergoing the Fourier-transformation, yields a spectrum that does not include any significant peak due to the solvent. Thereafter, the quantitative analysis is performed by measuring the areas under the respective component peaks and simultaneously solving a series of equations in which the weight of the various components is proportional to the respective areas under the peaks and to the gain settings of the spectrometer.

Quantitative analysis of nuclear magnetic resonance spectra having

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San Martin, CA, United States of America

Donald Clifford Hofer