Olympus Ndt

Sciaps, Inc.

Innov-x-systems, Inc.

Don Sackett

Brad Hubbard-Nelson

Brendan Connors

A dual source system and method includes a high power laser used to determine elemental concentrations in a sample and a lower power device used to determine compounds present in the sample. A detector subsystem receives photons from the sample after laser energy from the high power laser strikes the sample and provides a first signal. The detector subsystem then receives photons from the sample after energy from the lower power device strikes the sample and provides a second signal. The high power laser is pulsed and the first signal is processed to determine elemental concentrations present in the sample. The lower power device is energized and the second signal is processed to determine compounds present in the signal. Based on the elemental concentrations and the compounds present, the compounds present in the sample are quantified.

Dual source system and method

An XRF analysis apparatus includes a housing with a source of penetrating radiation to be directed at a sample and a detector for detecting fluoresced radiation from the sample. A shield is attachable to the housing to protect the user from radiation and a safety interlock is configured to detect whether or not the shield is attached to the housing. A controller is responsive to the safety interlock, and configured to monitor usage of the source of radiation at or above a predetermined power level when the shield is not attached to the housing and provide an output signal when the monitored usage of the source of penetrating radiation at or above the predetermined power level without the shield attached to the housing exceeds one or more predetermined thresholds.

X-ray analysis apparatus with radiation monitoring feature

An XRF system, preferably handheld, includes an X-ray source for directing X-rays to a sample, a detector responsive to X-rays emitted by the sample, and a filter assembly with multiple filter materials located between the X-ray source and the detector. An analyzer is responsive to detector and is configured to analyze the intensities of X-rays irradiated by the sample at one power setting and to choose a filter material which suppresses certain intensities with respect to other intensities. A device, controlled by the analyzer, automatically moves the filter assembly to the chosen filter material and then the analyzer increases the power setting to analyze certain non-suppressed intensities.

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Bedford, MA, United States of America

Don Sackett