Oc Oerlikon Balzers Ag

Dominik Wimo Amman

Siegfried Krassnitzer

Jürgen Weichart

The present invention concerns a procedure for the production of a plasma that is at least co-produced in the vacuum chamber () of a vacuum recipient () of a device suitable for plasma processing with at least one induction coil () carrying an alternating current, where the gas used to produce the plasma is fed into the vacuum chamber () through at least one inlet () and the vacuum chamber () is subject to the pumping action of at least one pump arrangement (), and where a possibly pulsed direct current is also applied to the induction coil () in order to influence the plasma density.

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Fürstentum, Liechtenstein

Dominik Wimo Amman