Omnivision Technologies, Inc.

Dominic Massetti

Dyson Hsinchih Tai

Chih-Wei Hsiung

Howard E Rhodes

Gang Chen

Eric A G Webster

Chia-Ying Liu

Wu-Zang Yang

Chun-Yung Ai

Duli Mao

Yin Qian

Ming Zhang

Johannes Solhusvik

Oray Orkun Cellek

Yuanwei Zheng

Lequn Liu

Suganda Jutamulia

Dyson Hsin-Chih Tai

Manoj Bikumandla

Libo Weng

Arvind Kumar

Eric Webster

Yu Zheng

Xiao Ying Hong

An alignment layer for a liquid crystal on silicon (LCOS) display includes a nano-particle layer. In a particular embodiment the nano-particle layer includes a lower nano-layer and an upper nano-layer, each formed onto oxide layers of the LCOS display. In a more particular embodiment, the lower nano-layer and the upper nano-layer are offset printed onto the oxide layers.

Method to make LCOS oxide alignment layer by offset print

A method of image sensor fabrication includes forming a second semiconductor layer on a back side of a first semiconductor layer. The method also includes forming one or more groups of pixels disposed in a front side of the first semiconductor layer. The one or more groups of pixels include a first portion of pixels separated from the second semiconductor layer by a spacer region, and a second portion of pixels, where a first doped region of the second portion of pixels is in contact with the second semiconductor layer. Pinning wells are also formed and separate individual pixels in the one or more groups of pixels, and the pinning wells extend through the first semiconductor layer. Deep pinning wells are also formed and separate the one or more groups of pixels.

Visible and infrared image sensor

A pixel array including an SiGelayer disposed on a first semiconductor layer. A plurality of pixels is disposed in the first semiconductor layer. The plurality of pixels includes: (1) a first portion of pixels separated from the SiGelayer by a spacer region and (2) a second portion of pixels including a first doped region in contact with the SiGelayer. The pixel array also includes pinning wells disposed between individual pixels in the plurality of pixels. A first portion of the pinning wells extend through the first semiconductor layer. A second portion of the pinning wells extend through the first semiconductor layer and the SiGelayer.

A method of fabricating a pixel array includes forming a transistor network along a frontside of a semiconductor substrate. A contact element is formed for every pixel in the pixel array that is electrically coupled to a transistor within the transistor network. An interconnect layer is formed upon the frontside to control the transistor network with a dielectric that covers the contact element. A cavity is formed in the interconnect layer. A conductive layer is formed along cavity walls of the cavity and a dielectric layer is formed over the conductive layer within the cavity. A photosensitive semiconductor material is deposited over the dielectric layer within the cavity. An electrode cavity is formed that extends into the contact element. The electrode cavity is at least partially filled with a conductive material to form an electrode. The electrode, the conductive layer, and the photosensitive semiconductor material form a photosensitive capacitor.

Photosensitive capacitor pixel for image sensor

A back side illuminated image sensor includes a pixel array including semiconductor material, and image sensor circuitry disposed on a front side of the semiconductor material to control operation of the pixel array. A first pixel includes a first doped region disposed proximate to a back side of the semiconductor material and extends into the semiconductor material a first depth to reach the image sensor circuitry. A second pixel with a second doped region is disposed proximate to the back side of the semiconductor material and extends into the semiconductor material a second depth which is less than the first depth. A third doped region is disposed between the second doped region and the image sensor circuitry on the front side of the semiconductor material. The third doped region is electrically isolated from the first doped region and the second doped region.

Image sensor with enhanced quantum efficiency

A projector and associated method allows adaptor-less smartphone eye imaging. The projector includes at least two line generators for projecting a pattern onto a face of a subject, and a structure for positioning the line generators relative to a camera of the smartphone. The pattern facilitates positioning of the smartphone relative to the subject's eye such that an image of the eye captured by the camera is optimal for evaluation.

Projector for adaptor-less smartphone eye imaging and associated methods

An image sensor for capturing X-ray image data and optical image data includes an X-ray absorption layer and a plurality of photodiodes disposed in a semiconductor layer. The X-ray absorption layer is configured to emit photons in response to receiving X-ray radiation. The plurality of photodiodes disposed in the semiconductor layer is optically coupled to receive image light to generate the optical image data, and is optically coupled to receive photons from the X-ray absorption layer to generate X-ray image data.

X-ray and optical image sensor

An image sensor pixel, and image sensor, and a method of fabricating the same is disclosed. The image pixel includes a photosensitive capacitor and a transistor network. The photosensitive capacitor includes an electrode, a conductive layer, a dielectric layer, and a photosensitive semiconductor material. The conductive layer is disposed around the electrode and the dielectric layer is formed between the conductive layer and the electrode. The photosensitive semiconductor material is for generating an image signal in response to image light and is disposed between the dielectric layer and the electrode. The transistor network is coupled to readout the image signal from the electrode of the photosensitive capacitor.

A pixel cell includes a photodiode coupled to photogenerate image charge in response to incident light. A deep trench isolation structure is disposed proximate to the photodiode to provide a capacitive coupling to the photodiode through the deep trench isolation structure. An amplifier transistor is coupled to the deep trench isolation structure to generate amplified image data in response to the image charge read out from the photodiode through the capacitive coupling provided by the deep trench isolation structure. A row select transistor is coupled to an output of the amplifier transistor to selectively output the amplified image data to a column bitline coupled to the row select transistor.

Image sensor pixel cell with non-destructive readout

Techniques and mechanisms for generating a random number. In an embodiment, a first signal is received from a first cell including a first source follower transistor. Circuit logic detects for a pulse of the first signal and, in response to the pulse, generates a signal indicating detection of a first random telegraph noise event in the first source follower transistor. In another embodiment, a first count update is performed in response to the indicated detection of the first random telegraph noise event. The first count update is one basis for generation of a number corresponding to a plurality of random telegraph noise events.

Apparatus, method and system for random number generation

A CMOS (Complementary Metal Oxide Semiconductor) pixel for sensing at least one selected from a biological, chemical, ionic, electrical, mechanical and magnetic stimulus. The CMOS pixel includes a substrate including a backside, a source coupled with the substrate to generate a background current, and a detection element electrically coupled to measure the background current. The stimulus, which is to be provided to the backside, affects a measurable change in the background current.

Backside stimulated sensor with background current manipulation

A backside illuminated image sensor has a carbon nanotube transparent conductive coating formed on the backside of the image sensor. In one implementation the carbon nanotube transparent conductive coating acts as a wavelength selective filter to filter out infrared light. In one implementation the carbon nanotube transparent conductive coating has an optical transparency between 50% and 80% for blue and green color bands.

Apparatus and method for image sensor with carbon nanotube based transparent conductive coating

A color pixel array includes a plurality of micropixels. Each micropixel includes a photosensitive element and a filter element optically aligned with the photosensitive element such that incident light passes through the filter element prior to reaching the photosensitive element. The micropixels are organized into triangular macropixels that each includes multiple micropixels. A perimeter shape of each of the triangular macropixels forms a triangle. The triangular macropixels have a repeating pattern across the color pixel array.

Imager with variable area color filter array and pixel elements

An example double-sided image sensor includes a semiconductor die, a photodetector, a charge-to-voltage converter, and support circuitry. The semiconductor die has a first side and a second side that is opposite the first side. The photodetector is disposed within the semiconductor die on the first side for accumulating an image charge in response to light incident on the first side. The charge-to-voltage converter is disposed within the semiconductor die on the first side. The transfer gate is also disposed on the first side of the semiconductor die between the photodetector and the charge-to-voltage converter to transfer the image charge from the photodetector to the charge-to-voltage converter. Support circuitry of the image sensor is disposed within the semiconductor die on the second side and is electrically coupled to the charge-to-voltage converter.

Double-sided image sensor formed on a single semiconductor wafer die

Embodiments of an apparatus comprising a CMOS image sensor including a pixel array formed in a substrate and a light guide formed on the substrate to receive light traveling in a plane parallel to a plane of the pixel array and incident on the edge of the image sensor and to re-direct the incident light into at least one pixel of the pixel array. Embodiments of an optical touch-screen imager comprising a substantially planar touch area and a detector positioned adjacent to the touch area, the detector comprising a CMOS image sensor as described above.

Growing community of inventors

San Jose, CA, United States of America

Dominic Massetti