Semes Co., Ltd.

Do-Youn Lim

Boong Kim

Joo Jib Park

Jung Suk Goh

Kuk Saeng Kim

Kisang Eum

Wan Hee Jeong

Eung Seok Kim

Joonho Won

Yeon Hyuk Jung

Byoung Ho Jung

The present invention provides a liquid supplying unit, including: a nozzle; a liquid supply pipe configured to supply a treatment liquid to the nozzle; and an impurity removing unit installed in the liquid supply pipe to remove an impurity in the treatment liquid, in which the impurity removing unit includes: a measuring unit configured to measure a characteristic of the impurity in the treatment liquid and form impurity data; a vibrating unit configured to apply vibration to the treatment liquid; a capturing unit configured to adsorb the impurity in the treatment liquid to which the vibration is applied; and a control unit configured to control the measuring unit and the vibration unit, and when the impurity data exceeds a reference data range, the control unit operates the vibrating unit.

Liquid supplying unit and liquid supplying method

The inventive concept provides a transfer assembly. The transfer assembly includes a transfer robot configured to take out the transfer object stored at the cassette and to transfer in a first direction to the target position; and a guide unit providing a transfer passage for transferring the transfer object, and wherein the guide unit comprises: a first guide member provided with its lengthwise direction in the first direction; and a second guide member provided with its lengthwise direction in the first direction, and space apart from the first guide member in a second direction perpendicular to the first direction the first guide member and the second member defining the transfer passage therebetween, and wherein at least a portion of the first guide member is movable such that a width of the transfer passage is changeable by the movement of the at least a portion of the first guide member.

Guide unit, transfer assembly and die bonding apparatus including the same

Embodiments of the inventive concept relate to an apparatus for treating a substrate in a high-pressure atmosphere. The apparatus includes a process chamber having an upper body and a lower body that are combined with each other to provide a treatment space therein, an elevation member configured to elevate any one of the upper body and the lower body to an opening location at which the upper body and the lower body is spaced apart or a closing location at which the upper body and the lower body is attached, a clamping member configured to clamp the upper body and the lower body located at the closing location, and a movable member configured to move the clamping member to a locking location at which the clamping member clamps the process chamber or to the release location at which the clamping member is spaced apart from the process chamber.

Apparatus and method for treating substrate

Growing community of inventors

Chungcheongnam-do, South Korea

Do-Youn Lim