American Air Liquide, Inc.

Dmitry Znamensky

Benjamin Jurcik

Tracey Jacksier

James J McAndrew

Ronald S Inman

James J F McAndrew

Carol Ann Schnepper

Alan D Zdunek

Complex fluidic micro electromechanical systems (MEMS) are incorporated into high purity chemical delivery systems, while maintaining valve sealing integrity, quality and performance of the system. In particular, fluidic MEMS systems are incorporated into high purity chemical delivery systems for semiconductor fabrication processes.

Micro electromechanical systems for delivering high purity fluids in a chemical delivery system

Provided are novel methods of preventing deposition on an optical component in an absorption spectroscopy measurement cell. The methods involve performing an absorption spectroscopy measurement of a sample gas introduced into the cell, and introducing a flow of purge gas from a purge gas inlet pipe across a critical surface of the optical element at a velocity effective to prevent deposition on the critical surface. The gas inlet is disposed adjacent said critical surface. Also provided are devices for practicing the inventive method, measurement cells useful in absorption spectroscopy measurements, apparatuses for performing an absorption spectroscopy measurement and semiconductor processing apparatuses. The invention allows for the performance of accurate spectroscopic measurements. Because deposits are prevented from forming on the surface of an optical element, interference therefrom can effectively be avoided.

Method and system for preventing deposition on an optical component in a spectroscopic sensor

Provided is a novel method for rapidly determining an impurity level in a gas source. A gas source and a measurement tool are provided for measuring an impurity level in a gas flowing from the gas source. The measurement tool is in communication with the gas source through a sampling line. The sampling line has a gas inlet disposed upstream from a gas outlet. The sampling line is baked according to a baking strategy, such that when baking is terminated, a concentration profile of the impurity in the sampling line contains a first region and a second region. In the first region, extending from the gas inlet to a point downstream from the inlet, the vapor phase concentration of the impurity is less than the vapor phase concentration of the impurity in the gas entering the sampling line. In the second region, located downstream from the first region and extending to the gas outlet, the vapor phase concentration of the impurity is greater than the vapor phase concentration of the impurity in the gas entering the sampling line. A method for rapidly determining an impurity level in a gas distribution system which delivers gas to a point of use is also provided. Particular applicability is found in the semiconductor processing industry to measure impurities in gases delivered to processing tools.

Method for rapidly determining an impurity level in a gas source or a

Growing community of inventors

Darien, IL, United States of America

Dmitry Znamensky