Nova Measuring Instruments Ltd.

Dmitry Kislitsyn

Wei Ti Lee

Heath A Pois

James Chen

Laxmi Warad

Saurabh Singh

Parker Lund

Benny Tseng

A system to characterize a film layer within a measurement box is disclosed. The system obtains a first mixing fraction corresponding to a first X-ray beam, the mixing fraction represents a fraction of the first X-ray beam inside a measurement box of a wafer sample, the measurement box represents a bore structure disposed over a substrate and having a film layer disposed inside the bore structure. The system obtains a contribution value for the measurement box corresponding to the first X-ray beam, the contribution value representing a species signal outside the measurement box that contributes to a same species signal inside the measurement box. The system obtains a first measurement detection signal corresponding to a measurement of the measurement box using the first X-ray beam. The system determines a measurement value of the film layer based on the first measurement detection signal, the contribution value, and the first mixing fraction.

Characterizing and measuring in small boxes using XPS with multiple measurements

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Fremont, CA, United States of America

Dmitry Kislitsyn