Asml Netherlands B.v.

Dmitriy Victorovich Lopaev

Vadim Yevgenyevich Banine

Arno Jan Bleeker

Johannes Hubertus Josephina Moors

Vladimir Vitalevitch Ivanov

Vladimir Vitalevich Ivanov

Konstantin Nikolaevitch Koshelev

Vladimir Mihailovitch Krivtsun

Konstantin Nikolaevich Koshelev

Pavel Stanislavovich Antsiferov

Johannes Hubertus Johannes Moors

Aleksander Sergeevich Kovalev

Tatyana Victorovna Rakhimova

A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.

Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus

A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.

Lithographic apparatus and device manufacturing method

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Moscow, Russia

Dmitriy Victorovich Lopaev