Cadence Design Systems, Inc.

D2s, Inc.

Dmitri Lapanik

Takashi Mitsuhashi

Shohei Matsushita

Zhigang Wu

Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.

Method and system for stencil design for particle beam writing

Various embodiments of the present invention are generally directed to a method, system, and computer program product for implementing direct measurement model with simulation and calibration of manufacturing process model in the manufacturing of precision devices such as electronic integrated circuits. The method and the system determine the measured measurement result and the direct measurement information and compare the direct measurement information against the other to determine whether to adjust the process models and the empirical parameters thereof.

Method, system, and computer program product for implementing a direct measurement model for an electronic circuit design

A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.

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Kanagawa, Japan

Dmitri Lapanik