Atomera Incorporated

Luxera, Inc.

Dmitri Choutov

Nyles Wynn Cody

Robert John Stephenson

Richard Burton

Robert J Mears

Daniel J Connelly

Erwin Trautmann

Leonard Simon Livschitz

Hideki Takeuchi

Keith Doran Weeks

Yi-Ann Chen

Yung-Hsuan Yang

A vertical semiconductor device may include a semiconductor substrate having at least one trench therein, and a superlattice layer extending vertically adjacent the at least one trench. The superlattice layer may comprise stacked groups of layers, with each group of layers comprising stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer. Each at least one non-semiconductor monolayer of each group of layers may be constrained within a crystal lattice of adjacent base semiconductor portions. The vertical semiconductor device may also include a doped semiconductor layer adjacent the superlattice layer, and a conductive body adjacent the doped semiconductor layer on a side thereof opposite the superlattice layer and defining a vertical semiconductor device contact.

Vertical semiconductor device with enhanced contact structure and associated methods

A vertical semiconductor device may include a semiconductor substrate having at least one trench therein, and a superlattice liner at least partially covering sidewall portions of the at least one trench and defining a gap between opposing sidewall portions of the superlattice liner. The superlattice liner may include a plurality of stacked groups of layers, each group of layers comprising stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer, with each at least one non-semiconductor monolayer of each group being constrained within a crystal lattice of adjacent base semiconductor portions. The device may also include a semiconductor layer on the superlattice liner and including a dopant constrained therein by the superlattice liner, and a conductive body within the at least one trench defining a source contact.

A method for making a semiconductor device may include forming an isolation region adjacent an active region in a semiconductor substrate, and selectively etching the active region so that an upper surface of the active region is below an adjacent surface of the isolation region and defining a stepped edge therewith. The method may further include forming a superlattice overlying the active region. The superlattice may include stacked groups of layers, with each group of layers comprising stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions.

Method for making a semiconductor device including a superlattice within a recessed etch

A method for making a semiconductor device may include forming a trench in a semiconductor substrate, and forming a superlattice liner covering bottom and sidewall portions of the trench. The superlattice liner may include a plurality of stacked groups of layers, with each group of layers including a plurality of stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The method may further include forming a semiconductor cap layer on the superlattice liner and having a dopant constrained therein by the superlattice liner, and forming a conductive body within the trench.

Method for making a semiconductor device including enhanced contact structures having a superlattice

A semiconductor device may include a semiconductor substrate having a trench therein, and a superlattice liner at least partially covering bottom and sidewall portions of the trench. The superlattice liner may include a plurality of stacked groups of layers, with each group of layers including a plurality of stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The semiconductor device may further include a semiconductor cap layer on the superlattice liner and having a dopant constrained therein by the superlattice liner, and a conductive body within the trench.

Semiconductor device including enhanced contact structures having a superlattice

A driver device for driving an LED lighting device includes at least one power switch adapted to operate at a switching frequency of greater than 500 KHz and adapted to control the driving current provided to the LED lighting device. Operating the power switch at such a high frequency allows a substantial reduction in passive devices such as inductors and capacitors.

LED driver for driving LED lighting device at high frequency

A compact driver device for driving an LED lighting device is provided. The driver device includes a substrate, power capacitor that provides LED driving current to drive the LED lighting device, and a power resistor. Advantageously, the power capacitor and the power resistor are attached to the substrate and are solderlessly connected to each other to provide a very compact driver device.

Integrated electronic device for controlling light emitting diodes

An integrated 3-dimensional inductor device is provided. The inductor device includes a substrate having an electrical trace and a 3-dimensional inductor attached to the substrate. The inductor includes a magnetic core and a coil whose windings are formed from the electrical traces of the substrate and conductive material in the interconnect vias.

Growing community of inventors

Sunnyvale, CA, United States of America

Dmitri Choutov