Carl Zeiss Multisem Gmbh

Carl Zeiss Microscopy Gmbh

Applied Materials Israel Limited

Carl Zeiss Smt Gmbh

Dirk Zeidler

Christof Riedesel

Stefan Schubert

Thomas Kemen

Joerg Jacobi

Ingo Mueller

Ralf Lenke

Arne Thoma

Antonio Casares

Mario Muetzel

Gunther Scheunert

Gerd Ludwig Benner

Nico Kaemmer

Georgo Metalidis

Gregor Dellemann

Christian Crueger

Hans Fritz

Pascal Anger

Michael Behnke

Markus Doering

Juergen Kynast

Anna Lena Eberle

Rainer K Knippelmeyer

Thomas Korb

Steven Robert Rogers

Erik Essers

Andreas Schmaunz

Jens Timo Neumann

Christian Wojek

Ulrike Zeile

Ulrich Bihr

Michel Le Maire

Wolfgang Hoegele

Yanko Sarov

Michael Schall

Nissim Elmaliah

Andreas Adolf

Christoph Riedesel

Joaquin Correa

Philipp Huethwohl

Markus Esseling

Jörg Jacobi

Ingo Müller

Nicolas Kaufmann

Daniel Boecker

András G Major

Nicole Rauwolf

Dieter Schumacher

Wilhelm Bolsinger

Georg Kurij

András Major

Nicole Bengesser

Anger Pascal

A method for operating a multi-beam particle beam microscope includes: scanning a multiplicity of particle beams over an object; directing electron beams emanating from impingement locations of the particle beams at the object onto an electron converter; detecting first signals generated by impinging electrons in the electron converter via a plurality of detection elements of a first detection system during a first time period; detecting second signals generated by impinging electrons in the electron converter via a plurality of detection elements of a second detection system during a second time period; and assigning to the impingement locations the signals which were detected via the detection elements of the first detection system during the first time period, for example on the basis of the detection signals which were detected via the detection elements of the second detection system during the second time period.

Method for operating a multi-beam particle beam microscope

A particle beam system, such as a multi-beam particle microscope, includes a multi-beam deflection device and a beam stop. The multi-beam deflection device is arranged in the particle-optical beam path downstream of the multi-beam generator and upstream of the beam switch of the particle beam system. The multi-beam deflection device serves collectively blanks a multiplicity of charged individual particle beams. These impinge on a beam stop, which is arranged in the particle-optical beam path level with a site at which a particle beam diameter is reduced or is at a minimum. By way of example, such sites are the cross-over plane of the individual particle beams or an intermediate image plane. Associated methods for operating the particle beam system and associated computer program products are disclosed.

Particle beam system including a multi-beam deflection device and a beam stop, method for operating the particle beam system and associated computer program product

A system includes a multi-beam particle microscope for imaging a 3D sample layer by layer, and a computer system with a multi-tier architecture is disclosed. The multi-tier architecture can allow for an optimized image processing by gradually reducing the amount of parallel processing speed when data exchange between different processing systems and/or of data originating from different detection channels takes place. A method images a 3D sample layer by layer. A computer program product includes a program code for carrying out the method.

System comprising a multi-beam particle microscope and method for operating the same

A particle beam system includes: a multi-beam particle source configured to generate a multiplicity of particle beams; an imaging optical unit configured to image an object plane in particle-optical fashion into an image plane and direct the multiplicity of particle beams on the image plane; and a field generating arrangement configured to generate electric and/or magnetic deflection fields of adjustable strength in regions close to the object plane. The particle beams are deflected in operation by the deflection fields through deflection angles that depend on the strength of the deflection fields.

Particle beam system

A multiple particle beam microscope and an associated method set a desired focal plane with an optical resolution and set a telecentric irradiation with the plurality of the primary beams. A method determines an optimal setting plane, into which an object surface is brought. Further, a system provides an improved resolution and telecentric irradiation for a large number of primary beams. Targeted selection and targeted individual influencing of individual primary beams and/or a mechanism means for influencing the plurality of primary beams in collective fashion can be implemented.

Multiple particle beam microscope and associated method with an improved focus setting taking into account an image plane tilt

A method includes: providing position data for a plurality of areas on the sample which are to be inspected; providing a first raster arrangement of the plurality of individual particle beams, with a single field of view on the sample assigned to each individual particle beam; defining the position of a nominal scanning area in each single field of view in relation to the first raster arrangement, with the dimensions of the nominal scanning area smaller than the complete single field of view; determining an individual position deviation between a nominal scanning area and the area to be inspected for the at least one individual particle beam; changing the first raster arrangement based on the determined individual position deviation to produce a second raster arrangement of the plurality of individual particle beams; and area-wise scanning the sample using the plurality of individual particle beams in the second raster arrangement.

Method for area-wise inspecting a sample via a multi-beam particle microscope, computer program product and multi-beam particle microscope for semiconductor sample inspection, and its use

A method of operating a multi-beam particle beam system includes: generating a multiplicity of particle beams such that they each pass through multipole elements that are either intact or defective; focusing the particle beams in a predetermined plane; determining excitations for the deflection elements of the multipole elements; exciting the deflection elements of the multipole elements that are intact with the determined excitations; modifying the determined excitations for the deflection elements of the multipole elements that are defective; and exciting the deflection elements of the defective multipole elements with the modified excitations. Modifying the determined excitations includes adding corrective excitations to the determined excitations. The corrective excitations are the same for all deflection elements of the defective multipole element.

Multi-beam particle beam system and method for operating same

A particle beam system includes a multi-beam particle source and a magnetic multi-deflector array. The magnetic multi-deflector array includes a coil that is arranged such that, during use of the particle beam system, a multiplicity of individual particle beams substantially passes through the first coil so that they are deflected in an azimuthal direction to correct an azimuthal telecentricity error of the particle beam system so that the individual particle beams telecentrically impinge on an object plane of the particle beam system.

Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system

A particle beam system and, such as a multi-beam particle microscope, can have a current intensity of individual particle beams that is flexibly set over large value ranges without structural modifications. The particle beam system can include a condenser lens system, a pre-multi-lens array with a specific pre-counter electrode and a pre-multi-aperture plate, and a multi-lens array. The system can includes a controller to supply adjustable excitations to the condenser lens system and the pre-counter electrode so that the charged particles are incident on the pre-multi-aperture plate in telecentric manner.

Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams

A method, including: recording plural images of an object by scanning plural particle beams across the object and detecting signals generated by the particle beams, wherein the plural particle beams are generated by a multi-beam particle microscope; determining plural regions of interest; determining plural image regions in each of the recorded images; determining plural displacement vectors; and determining image distortions based on image data of the recorded images and the determined displacement vectors.

Method of recording an image using a particle microscope

A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

Particle beam system and method for the particle-optical examination of an object

A method for detector equalization during the imaging of objects with a multi-beam particle microscope includes performing an equalization on the basis of individual images in or on the basis of overlap regions. For detector equalization, contrast values and/or brightness values are used and iterative methods can be employed.

Method for detector equalization during the imaging of objects with a multi-beam particle microscope

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Oberkochen, Germany

Dirk Zeidler