Asml Netherlands B.v.

Dirk Jerome Andre Senden

Andre Bernardus Jeunink

Siegfried Alexander Tromp

Yuri Johannes Gabriël Van De Vijver

Thomas Poiesz

Abraham Alexander Soethoudt

Youssef Karel Maria De Vos

Coen Hubertus Matheus Baltis

Bert Dirk Scholten

André Schreuder

Justin Johannes Hermanus Gerritzen

Evelyn Wallis Pacitti

Ringo Petrus Cornelis Van Dorst

Arie Cornelis Scheiberlich

Jelmer Mattheüs Kamminga

Robby Franciscus Josephus Martens

Gerhard Albert Ten Brinke

A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

Lithographic apparatus, method for unloading a substrate and method for loading a substrate

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Eindhoven, Netherlands

Dirk Jerome Andre Senden