Aixtron Se

Dirk Heydhausen

Karsten Rojek

A substrate is coated with a multilayer structure which has layers of a first portion and layers of a second portion that are deposited on the layers of the first portion. During the deposition of at least one layer of the second portion, at least one optical measuring apparatus measures an emissivity value and a reflectance value on the broad side of the substrate, which broad side comprises the layer. Using a previously determined correction value, an actual value of a temperature of the broad side of the substrate is calculated and, using the actual value, a heating apparatus is controlled in order to control the temperature of the substrate to match a target value of the temperature of the broad side of the substrate. The correction value is determined during the deposition of the first portion, which is carried out immediately before the deposition of the second portion.

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Aachen, Germany

Dirk Heydhausen