Average Co-Inventor Count = 4.00
ph-index = 4
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Carl Zeiss Smt Gmbh (37 from 1,405 patents)
2. Asml Netherlands B.v. (13 from 4,883 patents)
3. Carl-zeiss-smt Ag (3 from 461 patents)
40 patents:
1. 12332576 - Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography
2. 12306551 - Projection exposure apparatus having a device for determining the concentration of atomic hydrogen
3. 12287588 - Method for operating an EUV lithography apparatus, and EUV lithography apparatus
4. 12140877 - Method for avoiding a degradation of an optical element, projection system, illumination system and projection exposure apparatus
5. 11199363 - Method for removing a contamination layer by an atomic layer etching process
6. 11022893 - Optical assembly with a protective element and optical arrangement therewith
7. 10712677 - Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning
8. 10690812 - Optical element and optical system for EUV lithography, and method for treating such an optical element
9. 10649340 - Reflective optical element for EUV lithography
10. 10073361 - EUV lithography system and operating method
11. 10061205 - Reflective optical element
12. 9996005 - Reflective optical element and optical system for EUV lithography
13. 9880476 - Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus
14. 9632436 - Optical assembly with suppression of degradation
15. 9354529 - Arrangement for use in a projection exposure tool for microlithography having a reflective optical element