Sinvaco N.v.

Dirk Cnockaert

Wilmert De Bosscher

The present invention provides a planar magnetron including a surface for mounting a planar substantially polygonal target (,) having a substantially central target area for sputtering onto a substrate. The magnetron comprises an array of magnets (,) defining a closed loop magnetic field for generating an elongated plasma race-track above the target (,). Means for establishing cyclical, relative, substantially translational movement between the race-track and the target support surface are provided, the substantially translational movement being substantially parallel to this surface and the trace of the substantially translational movement being a two-dimensional figure. The periphery of the race-track lies substantially within said substantially central target area throughout each cycle, the establishing means being adapted to provide a substantially uniform erosion of the target (,) at least within said substantially central target area.

Growing community of inventors

Deinze, Belgium

Dirk Cnockaert