National Taiwan University

Ding-Shyan Chen

Jeng-Ywan Jeng

Yih-Lin Cheng

Zhen-You Chen

The present invention provides a method for reducing a drawing force in a forming process of a photocurable material by adding a radical scavenger capable of terminating free radical polymerization into a substrate for carrying the photocurable material. The method comprises: providing a mold release composition at least comprising a radical scavenger and a molding agent; and forming a mold release film from the mold release composition by curing forming or by combining with an upper surface of a plate, thereby preparing the substrate. In this way, during the light curing reaction of the photocurable material by irradiation with a light source, the radical scavenger in the upper surface of the substrate contacting with the photocurable material can react with free radicals in the photocurable material, such that the photocurable material forms an uncured layer for which light curing does not occur on the upper surface of the substrate.

Growing community of inventors

Taipei, Taiwan

Ding-Shyan Chen