Kernforschungszentrum Karlsruhe Gmbh

Kernforschungszentrum Kalrsruhe Gmbh

Dietrich Munchmeyer

Wolfgang Ehrfeld

Erwin W Becker

Peter Hagmann

Asim Maner

Wilhelm Bier

Jurgen Mohr

Herbert Moser

Anton Heuberger

Hans Betz

A micro secondary electron multiplier or an array thereof employs discrete dynodes which are microstructured and applied to an insulating substrate plate. The substrate plate is provided with electrical conductor paths for the connection of the dynodes. The dynodes can be made using a technique such as X-ray depth lithography-galvanoplasty (the LIGA technique). The micro secondary electron multiplier or an array of such multipliers is extremely small and sensitive, and has a high time resolution. Furthermore there is considerable flexibility in positioning the multipliers of an array.

Micro secondary electron multiplier

A process for producing a filter including a microporous membrane and a supporting structure connected thereto, including producing a mold for the membrane and the supporting structure, filling the mold with a molding material whose solubility can be changed by high energy radiation, and forming the micropores by partial irradiation of the membrane with high energy radiation and removal of the regions having increased solubility. The filter produced according to the above method is a unitary structure with the supporting structure integrally connected to the membrane.

Microporous membrane filter and method of producing same

A cross flow microfilter comprises a filter housing having a flow chamber wherein a fluid is introduced on one side and a concentrate is removed on the opposite side a collection chamber from which a filtrate is removed, and at least one microporous membrane over whose one surface the fluid to be filtered flows in a parallel stream and whose other surface is oriented toward the collection chamber, the membrane having pores of a width between about 0.1 micron and 30 micron, the improvement wherein the pores of the membrane have slit-shaped cross-sections and given profiles, and are formed by a plurality of webs arranged in rows with predetermined spacing and by terminating plates which cover the webs, and the webs are applied onto one of the two plates by X-ray lithographic means, X-ray depth lithographic-galvanoplastic means, or molding and galvanoplastic means.

Cross flow microfilter

A method of producing a passive optical device having optical components including at least one reflection grating, at least one port for polychromatic light and a plurality of ports for monochromatic light. The method includes producing the optical components of the device utilizing X-ray depth lithography so that the grating lines of the reflection grating are parallel to the direction of X-ray radiation emitted as part of the X-ray depth lithography.

Method of producing a passive optical device including at least one

Method for producing a plurality of deformable connecting elements for electrically joining microelectronic components. The method includes irradiating with high energy radiation portions of a plate-like member composed of material having a material characteristic which is changed by such high energy radiation, each portion having dimensions corresponding to those of a connecting element; utilizing the changed material characteristic of the material of the irradiated portions to remove such material from the irradiated portions to produce a plate-like mold containing a plurality of mold structures each defining a shape corresponding to a connecting element at a given location of said member, each such mold structure having lateral dimensions and a height dimension which is a multiple of the smallest lateral dimension; filling the mold structures with metal by electroplating the metal into such mold structures to produce metallic connecting elements; fixing the connecting elements to a microelectronic component; and removing the plate-like mold.

Method for producing connecting elements for electrically joining

A method for producing a mask for deep-etch x-ray lithography in which the mask pattern of a thin-film mask having thin absorber structures is transferred by recopying with soft X-ray radiation to an X-ray resist layer whose layer thickness corresponds to the thickness of the absorber structures of the mask to be subsequently produced. Transfer errors during recopying are avoided by producing the thin-film mask directly on one side of a carrier membrane; applying a positive X-ray resist layer on the other side of the carrier membrane; irradiating the positive X-ray resist layer with approximately parallel X-ray radiation through the thin-film mask to produce irradiated portions in the positive X-ray resist layer; removing the irradiated portions of the positive X-ray resist layer to expose portions of the carrier membrane; electrolytically depositing elements having a high atomic number, e.g., heavy metals, onto the exposed portions of the carrier membrane, removing the remaining resist material and etching away the thin-film mask.

Method for producing deep-etch, X-ray lithography masks

In order to produce a plurality of plate shaped metal bodies containing a microstructure from a single molding tool constituting a master for the bodies, a negative mold is formed by filling the recesses in the microstructure of the tool with electrically insulating material and fastening to the insulating material an electrically conductive material which contacts the end faces of the microstructure of the tool.

Method for producing a plurality of plate shaped microstructured metal

Method for producing a separating nozzle element including a separating body and terminal plates, for the separation of a gaseous or vaporous mixture, wherein the separating body comprises separating structures which penetrate the separating body and define separating chambers and gas conduits, and the terminal plates are provided with channels for the intake and discharge of gas streams. A mold layer is produced which contains negative outlines of the separating structures. Thereafter, the negative outlines of the mold layer are filled with a structure material which is compatible with the gaseous or vaporous mixture to be separated to form the separating structures. The mold layer containing the negative outlines of the separating structure is produced by shaping the mold layer from a reusable tool provided with the positive outlines of the separating structures.

Method for producing separating nozzle elements

A separating nozzle element composed of a separating body and two cover plates between which the body is interposed, the nozzle element being used for the separation of gaseous or vaporous mixtures, is produced by providing a layer of a material whose ability to be removed from the layer can be altered by irradiation, the thickness of the layer being approximately equal to the thickness of the separating body, irradiating the layer, starting at one surface, with radiation which has a penetration depth into the material of the layer which is less than the thickness of the layer, in a pattern corresponding to the cross section of the separating body structure, and removing from the layer material which is more easily removable as a result of the irradiation, to thereby permit the radiation to penetrate to greater distances from the one surface, while continuing the removal of material until the entire thickness of the layer has been subjected to radiation and removal, to form a mold of the separating body. The mold is then filled with material constituting the separating body, whereafter the mold is removed.

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Stutensee, Germany

Dietrich Munchmeyer