Heraeus Quarzglas Gmbh

Heraeus Quarzglas Gmbh & Co Kg

Dietmar Hellmann

Wolfgang Englisch

Helmut Leber

Johann Leist

Poul E Breidenbach

Stephan Moritz

Gerard Lebrun

Katsuhiko Kemmochi

Christian Gebauer

A quartz glass component for a reactor chamber, especially of a plasma etching device, comprises a substrate of a first quartz glass quality with an inner surface having an average roughness depth R,of more than 1 &mgr;m, facing the inside of the reactor. To minimize particles in the reactor chamber, and to give the inner surface high adhesiveness for layers deposited on it and a long service life, a roughness zone is formed on the substrate by an open pore bubble layer made of a second quartz glass quality. The quartz glass component may be made by forming a blank from a granulate containing SiO,, and partial or complete vitrification of the blank by heating to a temperature above 1,000&deg; C. During the forming of the inner surface of the blank, an additional constituent is added to the granulate containing siO,in a roughness zone. The additional constituent reacts during the vitrification to release a gas, which forms a bubble layer during vitrification of the roughness zone.

Quartz glass component for a reactor housing a method of manufacturing same and use thereof

Quartz glass component used in the production of semiconductors

A silica glass member shows a glassy carbon coating wherein a surface of a silica glass substrate of the silica glass member shows a mean surface roughness (R.sub.a) in a range of 0.03 .mu.m to 2 .mu.m and it is coated with a glassy carbon coating. The member is manufactured by chemically roughening the substrate to a surface roughness in the above recited range; coating the surface of the silica glass substrate with an organic raw material containing carbon, curing and thereafter carbonizing the film of the organic raw material by forming a glassy carbon coating.

Silica glass member with glassy carbon coating method for producing the

Molded body of quartz glass and process for the production of a molded

Quartz glass component having a coating with a silicon carbide surface includes a gradient layer of silicon carbide and at least one additional constituent which is less hard and has a lower modulus of elasticity than silicon carbide and whose concentration decreases across the thickness of the layer from inside to outside. The coated component has good thermal-shock resistance and long-term stability in terms of its chemical resistance to hydrofluoric acid and nitric acid as well as to a mixture of these two acids.

Coated quartz glass component

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Linsengericht, Germany

Dietmar Hellmann