Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Dieter Schmerek

Detlev Mueller

Karl-Heinz Schuster

Damian Fiolka

Manfred Maul

Jens Kugler

Bernhard Gellrich

Christoph Zaczek

Alexandra Pazidis

Guido Limbach

Julian Kaller

Siebe Landheer

Thomas Schletterer

Gerald Richter

Herbert Fink

Gundula Weiss

Maria Johanna Agnes Rubingh

Alexander Hirnet

Hans-Juergen Scherle

Jürgen Hartmaier

Joachim Schroeder

Frank Marianek

Otto Hahnemann

Juergen Hartmaier

Uwe Schubert

Willem Van Schaik

Detlev Müller

A method of processing an optical element which has a substrate () and a layer system () applied to the substrate (), wherein the layer system () in a starting condition has a plurality of volume defects (), wherein the method includes at least partially filling at least one of the volume defects () with a filling material (). Also disclosed is an associated method of manufacturing an optical element.

Method of processing an optical element and an optical element, in particular for a microlithographic projection exposure apparatus

The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, including at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.

Optical system of an illumination device of a projection exposure apparatus

An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.

Optical element unit for exposure processes

In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.

System for flushing at least one internal space of an objective

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Huettlingen, Germany

Dieter Schmerek