Mapper Lithography IP B.v.

Voltea B.v.

Asml Netherlands B.v.

Hyva Holding B.v.

Diederik Geert Femme Verbeek

Jerry Johannes Martinus Peijster

Albert Van Der Wal

Hank Robert Reinhoudt

Lucas Johannes Cornelis Kouters

Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising:

Substrate processing apparatus

An apparatus to remove ions from water. The apparatus may include a stack having a first electrode including a first current collector, a spacer on top of the first electrode, and a second electrode on top of the spacer. The stack may have a tray to hold and position the stack within a housing of the apparatus and thus may improve the manufacturability of the apparatus.

Apparatus for removal of ions comprising multiple stacks

The invention relates to a substrate processing apparatus () comprising a support frame (), a radiation projection system () for projecting radiation onto a substrate to be processed, a substrate support structure () for supporting the substrate, and a fluid transfer system (). The radiation projection system comprises a cooling arrangement () and is supported by and vibrationally decoupled from the support frame such that vibrations of the support frame above a predetermined maximum frequency are substantially decoupled from the radiation projection system. The fluid transfer system comprises at least one tube () fixed at two points (), and comprises a flexible portion. A substantial part of the flexible portion extends over a plane substantially parallel to the substrate support structure surface. The stiffness of the flexible portion is adapted to substantially decouple vibrations at the second fixed point which are above the predetermined maximum frequency from the first fixed point.

A method of producing an apparatus for removal of ions from water. A stack of the apparatus may be manufactured by: providing a first electrode with a first current collector; providing a spacer on top of the first electrode; and providing a second electrode on top of the spacer. The first electrode may be connected with a first connector to a first power terminal and a pressure may be exerted on the stack so as to move the first and/or second electrodes. The first connector may allow movement of the first electrode with respect to the first power terminal.

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Pijnacker, Netherlands

Diederik Geert Femme Verbeek