Elf Atochem S.a.

Atochem

Didier Judas

Jean-Marc Sage

Philippe Blondel

Daniel Cuzin

Philippe Maj

Patrick Douais

Alain Fradet

Margarita Acevedo

Disclosed are polymers and copolymers containing at least one repeating unit of the formula ##STR1## in which X is O or NH; R is a single bond or a hydrocarbon chain; R' is a hydrocarbon chain containing one or two carbon atoms, and P is the residue of an oligomer HX--P--XH whose solution viscosity determined in meta-cresol at 30.degree. C. at concentrations of 0.5 g/dl is lower than 0.50 dl/g.sup.-1. Also disclosed is a process for obtaining the polymers and copolymers.

Polymers and copolymers originating from the addition of oligomers

Polyetheresteramides, characterized in that they comprise both of the following repeating entities: ##STR1## in which X represents the residue of a polyamide-diacid oligomer with an Mn of between 300 and 8000, Y represents the residue of a polyetherdiol with an Mn of between 200 and 5000, and Z represents the residue of a polyetherdiamine with an Mn of between 200 and 5000, wherein the proportion by mass of the entities Z resulting from the condensation of the polyetherdiamine with respect to the total amount of the entities resulting from the polyetherdiol and polyetherdiamine, i.e. Z/(Z+Y), is between 1 and 50%. The polyetheresteramides according to the invention can be used as is and are suitable for the production of mouldings, extrudates, films, sheaths, or composite materials such as multi-layer film. They can also be mixed with other polymers and in particular with polyamides. Additives such as heat stabilizers, antioxidizing agents, dyes, inorganic fillers, or various organics can also be added to them.

Polymers comprising both polyamide-diacid/polyetherdiol blocks and

The present invention relates to new polyamides comprising, on a mass basis: (a) 45 to 75% of an x,T unit, x being between 4 and 12 inclusive, the x,T unit being the condensation product of a diamine having x carbon atoms and of terephthalic acid, and (b) 55 to 25% of an aliphatic unit -HN-(CH.sub.2).sub.n -CO, n being between 6 and 14 inclusive. and the terpolyamides obtained by including a monomeric unit (c) such as the unit 6 or 6,I as a replacement for part of the aliphatic unit (b). The polyamide compositions thus obtained exhibit a Tg lower than 130.degree. C., a Tm higher than 230.degree. C. and a good crystallizability.

Polyamides and objects obtained from them

A process for the manufacture of polyamides consisting essentially of the stages of:

Process for the preparation of polyamides with oligomer formation

Novel thermotropic semialiphatic copolyesteramides having relatively low melt temperatures contain the following recurring structural units: ##STR1## in which Ar.sub.1 is a divalent aromatic and/or cycloaliphatic radical, Ar.sub.2 is a divalent aromatic radical, X is --NH-- or --CO--, and A includes a divalent aliphatic hydrocarbyl radical.

Thermotropic semialiphatic copolyesteramides

Novel thermotropic aromatic copolyesters comprise the following recurring structural units: ##STR1## and are prepared by polycondensing p-(p-hydroxyphenoxy)-benzoic acid with an aromatic or cycloaliphatic diacid, a diphenol and, optionally, p-hydroxybenzoic acid.

Thermotropic aromatic copolyesters comprising recurring structural units

Polyester amides and polyether thioether ester amides of the formula ##STR1## wherein A is a polyamide sequence,

Polyester amides and polyether thioether ester amides and process for

Novel polyesteramides and polyetheresteramides are provided which have the formula: ##STR1## wherein A represents a divalent polyamide group,

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Paris, France

Didier Judas