The Boeing Company

Dhananjay M Bhusari

Daniel C Law

Philip T Chiu

Richard Roland King

Dimitri Daniel Krut

Peter Hebert

Richard Thai

A method for fabricating an upright photovoltaic cell comprises growing one or more epitaxial layers on a substrate, thereby forming a diffused active junction on the substrate and one more additional active junctions above the diffused active junction. The method further comprises selectively etching an areal region of the one or more epitaxial layers, thereby forming a mesa on the substrate and exposing a substrate-contact region parallel to the areal region at a base of the mesa. The method further comprises depositing contact material onto the substrate-contact region, to form the first contact, and concertedly onto a mesa-contact region of the mesa, to form the second contact.

Upright photovoltaic cell with front contacts

The present disclosure generally relates to broadband antireflective coatings for reducing reflection of light in the infrared without compromising visible light reflectance in multijunction solar cells bonded to coverglass, and methods of forming the same. The antireflective coatings include a high index, one or more intermediate index, and low index of refraction dielectric layers. The high index dielectric layer utilizes an ion beam assisted deposition to maximize the density and index of refraction. The intermediate index layer(s) increase the bandwidth of the antireflection coating, thereby improving the performance of the antireflective coating in the infrared spectrum.

Broadband antireflection coatings under coverglass using ion gun assisted evaporation

The disclosure provides for a direct wafer bonding method including providing a bonding layer upon a first and second wafer, and directly bonding the first and second wafers together under heat and pressure. The method may be used for directly bonding an GaAs-based, InP-based, GaP-based, GaSb-based, or Ga(In)N-based device to a GaAs device by introducing a highly doped (Al)(Ga)InP(As)(Sb) layer between the devices. The bonding layer material forms a bond having high bond strength, low electrical resistance, and high optical transmittance.

Direct wafer bonding

A semiconductor device may include a first subassembly and a second subassembly. The first subassembly may include a first bonding layer. The second subassembly may include a second substrate and a second bonding layer directly bonded to the first bonding layer. The first bonding layer and the second bonding layer may be lattice-mismatched to one another. At least one of the following may be selected: the first bonding layer is lattice-mismatched to the first substrate, and the second bonding layer is lattice-mismatched to the second substrate.

Growing community of inventors

North Hills, CA, United States of America

Dhananjay M Bhusari