Uchicago Argonne, LLC

Devika Choudhury

Jeffrey W Elam

Anil U Mane

Angel Yanguas-Gil

Steven Payonk Letourneau

Kaizhong Gao

John N Hryn

Jason R Croy

Hakim H Iddir

Eungje Lee

Yuepeng Zhang

Arturo Gutierrez

Matthias John Young

Jihyeon Gim

Aliraeza Nassiri

David Joseph Mandia

A method for coating of lithium ion electrode materials via atomic layer deposition. The coated materials may be integrated in part as a dopant in the electrode itself via heat treatment forming a doped lithium electrode.

Modification of lithium ion electrode materials via atomic layer deposition techniques

A lithium boron coating and a method of producing the same. Atomic layer deposition deposits lithium and boron to form a lithium borate layer. The lithium borate maybe deposited as a solid electrolyte.

Atomic layer deposition of lithium boron comprising nanocomposite solid electrolytes

Coated nanofibers and methods for forming the same. A magnetic nanofiber is formed and a barrier coating is deposited on the magnetic nanofiber by atomic layer deposition ('ALD') process. The coated nanofiber may include a reduced magnetic nanostructure and a barrier coating comprising a first oxide coating on the nanofiber, the coating being non-reactive with the magnetic polymer nanofiber, the barrier coating have a thickness of 2 nm to 12 nm.

Creating and protecting magnetic nanomaterials

ALD and p-CVD methods to generate MgBand MgB-containing films in the growth temperature range of 250-300&#xb0; C. The thermal ALD and p-CVD methods shown herein ensure that the high-temperature-induced roughening, which causes high surface resistances in MgBcoatings grown by the mentioned conventional techniques, is avoided. The MgBand MgB-containing films exhibit superconductive properties at above 20&#xb0; K.

Methods for low-temperature p-CVD and thermal ALD of magnesium diboride

A method of etching an organic or hybrid inorganic/organic material. The method etches molecular layer deposition coatings. An etching cycle comprises a first half reaction exposing the coating to a precursor. A second half reaction exposes a second precursor, removing or etching a portion of the coating.

Molecular layer etching

An ultra-thin film transition metal dichalcogenide ('TMD') supported on a support. The TMD is formed from a metal grown by atomic layer deposition ('ALD') on a substrate. The metal is sulphurized to produce a TMD ultra-thin layer.

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Naperville, IL, United States of America

Devika Choudhury