Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Detlev Mueller

Dieter Schmerek

Karl-Heinz Schuster

Damian Fiolka

Manfred Maul

Jens Kugler

Bernhard Gellrich

Guido Limbach

Julian Kaller

Thomas Schletterer

Gundula Weiss

Hans-Juergen Scherle

Frank Marianek

Juergen Hartmaier

Otto Hahnemann

The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, including at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.

Optical system of an illumination device of a projection exposure apparatus

An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.

Optical element unit for exposure processes

Growing community of inventors

Ellwangen, Germany

Detlev Mueller