Eastman-kodak Company

Kodak Graphic Communications Gmbh

Detlef Pietsch

Harald Baumann

Udo Dwars

Bernd Strehmel

Tanja Ebhardt

Axel Draber

Ulrich Fiebag

Michael Flugel

Saija Werner

Michael Mursal

Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X, Xand Xare independently selected from straight-chain or cyclic C-Calkylene and C-Carylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R, Rand Rare independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R, Rand R, and (2) n&#x3e;2 in at least one of the groups R, Rand R, and (3) at least one group Ris different from H in formula (III). 

Photopolymer composition suitable for lithographic printing plates

Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pK&#x3c;5, wherein the acidic functional group can be present as a free acid group or in the form of a salt; (c) drying.

Method for making a lithographic plate

Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein &#x3c0;is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each Rand Ris independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group &#x2014;NRRand a group &#x2014;OR, each R, Rand Ris independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of &#x3e;1 and AS is an aliphatic spacer. 

Lithographic printing plate precursors with oligomeric or polymeric sensitizers

Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CXgroups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R, Rand Ris independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group &#x2014;NRRand a group &#x2014;, wherein Rand Rare independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, Ris an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5. 

Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon

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Badenhausen, Germany

Detlef Pietsch