U.S. Philips Corporation

Detlef G Schon

Udo Bringmann

Klaus Drews

Olaf H Dossel

Reiner U Orlowski

Klaus W Gerstenberg

Gerhard Kursten

Thin film strain gauge system consisting of an elastically deformable flexible metallic substrate on which an electrically insulating layer of a plasma-polymerized material, in particular of Si:N:O:C:H-containing compounds and thereon a structured resistance layer as well as an electrically readily conducting layer having a structure for the electrical contacting are provided.

Thin-film strain gauge system and method of manufacturing same

A device for covering a substrate by means of both plasma chemical vapor deposition and by high-frequency cathode sputtering which, as a result of easily exchangeable individual devices to introduce gaseous substances into the reaction space as well as easily exchangeable individual devices for influencing the flow of the process gases within the reaction space, results in a very good uniformity of the layer thickness of the produced layers even when the operation has to be carried out at higher gas pressures and hence higher flow rates.

Device for coating a substrate by means of plasma-CVD or cathode

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Halstenbek, Germany

Detlef G Schon