Malvern Panalytical B.v.

Panalytical B.v.

Detlef Beckers

Milen Gateshki

Alexander Kharchenko

Jaap Boksem

Vladimir Kogan

Klaus-Jürgen Steffens

Fabio Masiello

Eugene Reuvekamp

Stjepan Prugovecki

Jorg Bolze

Christian W Lehmann

Harald G Schweim

Jan Vugteveen

Nicholas Norberg

Klaus-Jurgen Steffens

The present invention relates to sample holder for holding a sample. The sample holder comprises a body having an incident surface and an opening in the body for receiving a sample. When the sample is irradiated with X-rays the incident surface of the sample holder may also be irradiated, especially at low incident angles. To reduce background scattering from the incident surface, the incident surface comprises a protrusion for blocking X-rays.

Sample holder for an X-ray analysis apparatus

The present invention relates to an X-ray analysis apparatus and a method of X-ray analysis. The X-ray analysis apparatus enables a user to carry out a plurality of X-ray analysis applications, for analysing a sample by measuring X-ray diffraction and/or X-ray fluorescence, using the same X-ray source. The apparatus comprises an X-ray source for irradiating the sample with X-rays, the X-ray source comprising a solid anode and a cathode for emitting an electron beam. It also comprises a focusing arrangement for focusing the electron beam onto the anode, and a controller. The controller is configured to receive X-ray analysis application information and to control the X-ray analysis apparatus to selectively operate in either a first X-ray analysis mode or a second X-ray analysis mode based on the X-ray analysis application information. In the first X-ray analysis mode the X-ray source operates at a first operating power and has an effective focal spot size that is less than 100 μm. In the second X-ray analysis mode the X-ray source operates at a second operating power that is higher than the first operating power, and the area of the effective focal spot is larger than the area of the effective focal spot in the first X-ray analysis mode.

Adaptable X-ray analysis apparatus

A beam shaping apparatus () for use in an X-ray analysis device (). The beam shaping apparatus processes an input beam () from an X-ray beam source (), and generates an output beam () with an output beam shape for irradiating a sample () held by a sample holder () of the X-ray analysis device. Movement of the output beam shape is controlled in dependence upon a varying tilt angle (χ) of the sample (), this defined by a tilt position of the sample holder ().

X-ray beam shaping apparatus and method

The sample mounting system comprises a sample holder and a sample stage having a platform for supporting the sample holder. The sample can be fixed to the sample holder by a mount. The sample holder comprises a holder reference portion, which co-operates with a corresponding reference portion of the sample stage (the stage reference portion) to align the sample holder with the sample stage. When the sample holder is positioned on the platform such that the stage reference portion and the holder reference portion engage each other, the sample holder is aligned with the sample stage.

Sample mounting system for an X-ray analysis apparatus

An X-ray analysis apparatus comprises an X-ray source configured to irradiate a sample with an incident X-ray beam. A first beam mask component is arranged between the X-ray source and the sample. The first beam mask component has a first opening for limiting the size of the incident X-ray beam. When the first beam mask component is in a first configuration, the first opening is arranged in the incident X-ray beam. The first beam mask component further comprises a second opening. When the first beam mask component is in a second configuration, the second opening is arranged in the incident X-ray beam. The second opening does not limit the size of the incident X-ray beam. A controller is configured to control a first beam mask component actuator to change the configuration of the first beam mask component between the first configuration and the second configuration by moving the first beam mask component in a plane intersected by the incident X-ray beam.

X-ray analysis apparatus and method

The X-ray analysis apparatus of the present invention comprises a sample stage for supporting a sample, a goniometer having an axis of rotation, and an X-ray detector arranged to be rotatable about the axis of rotation of the goniometer, wherein the X-ray detector is arranged to receive X-rays from the sample directed along an X-ray beam path. The X-ray analysis apparatus further comprises a first collimator, a second collimator and a third collimator each having a first configuration and a second configuration. In its first configuration, the collimator is arranged in the X-ray beam path. In its second configuration the collimator is arranged outside of the X-ray beam path. A first actuator arrangement is configured to move the first collimator and the second collimator between the first configuration and the second configuration by moving the first collimator and the second collimator in a lateral direction that intersects the X-ray beam path. A second actuator arrangement is configured to move the third collimator between its first configuration and its second configuration. A controller is configured to control the first actuator arrangement to move the first collimator between the first configuration and the second configuration.

X-ray analysis apparatus

An X-ray analysis apparatus and method. The apparatus comprises an adjustable slit () between an X-ray source () and a sample (); and optionally a further slit (). A controller () is configured to control a width of the adjustable slit, between a first width, a larger second width, and an even larger third width. At the first and second widths: the adjustable slit () limits the divergence of the incident beam and thereby limits an area of the sample that is irradiated; and the further slit () does not limit the divergence of the incident beam. At the third width: the adjustable slit () does not limit the divergence of the incident beam, and the further slit () limits the divergence of the incident beam and thereby limits the area of the sample that is irradiated. Alternatively, at the third width, the adjustable slit () continues to limit the area irradiated.

Apparatus and method for X-ray analysis with hybrid control of beam divergence

An X-ray diffraction apparatus for high resolution measurement combines the use of an X-ray source with a target having an atomic number Z less 50 with an energy resolving X-ray detector having an array of pixels and a beta radiation multilayer mirror for selecting the K-beta radiation from the X-ray source and for reflecting the K-beta radiation onto the sample where it is diffracted onto the energy resolving X-ray detector. The sample may in particular be in transmission. The sample may be a powder sample in a capillary.

High resolution X-ray diffraction method and apparatus

A sample holderfor holding a capillaryfor X-ray analysis has a first thermal transport memberon the base portionon one side of a longitudinal slitand a second thermal transport memberon the base portionon the other side. The thermal transport membersare compressed between a frameand the base portionin the transverse direction to urge the edges of the first and second thermal transport members together, to hold a capillarylongitudinally aligned with the longitudinal slit

Sample holder for X-ray analysis

Apparatus for computed tomography is described that is also suitable for X-ray diffraction. The computed tomography measurement uses a line focusand passes the X-rays from the line focus through a perpendicular slitand then through a sample onto a two dimensional detector. A plurality of images are taken, each with the sample rotated about a rotation axisby a different amount, and combined to create a computed tomography image.

Computed tomography

X-ray diffraction apparatus includes a flat graded multilayerwhich may be used in a SAXS configuration for a sample. The apparatus may be adapted for Bragg-Brentano measurements by a collimatorwithout the need for alternate beam paths or complex arrangements.

X-ray apparatus

A method of imaging phases in an inhomogeneous polycrystalline sample having a plurality of crystallites of at least a first crystalline component includes illuminating an illuminated area extending across a surface of a sample with substantially monochromatic X-rays incident at a Bragg-Brentano parafocussing geometry at first angle &#x3b8;to the surface of the sample. X-rays diffracted by the sample at a second angle &#x3b8;pass through a pinhole. The diffraction angle &#x3b8;+&#x3b8;fulfils a Bragg condition for the first crystalline component which is imaged by a detector to provide a two-dimensional image of the first crystalline component at the surface of the sample.

Diffraction imaging

A method of X-ray diffraction illuminates a beam () of X-rays along an illuminated strip () on a surface () of a sample (). The X-rays are diffracted by the sample () and pass through a mask () having a slit extending essentially perpendicularly to the strip (). The X-rays are detected by a two-dimensional X-ray detector to measure the diffracted X-rays at different positions along the strip ().

Microdiffraction

Angle dispersive X-ray diffraction is used to test pharmaceutical products including a dosage form inside packaging, for example a tablet inside a blister pack, without removing the dosage form from the packaging. The dosage form is aligned with a measurement system having an X-ray source for generating X-rays, X-ray optics, and an X-ray detector for detection of X-rays. Then, at least one X-ray signature is measured on a predetermined location on the dosage form. The measured X-ray signature is compared with reference X-ray signatures in a data library.

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Almelo, Netherlands

Detlef Beckers