Asml Netherlands B.v.

Asml Holding N.v.

Derk Servatius Gertruda Brouns

Paul Janssen

Matthias Kruizinga

Arnoud Willem Notenboom

James Norman Wiley

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Marcus Adrianus Van De Kerkhof

Pieter-Jan Van Zwol

Mária Péter

David Ferdinand Vles

Willem Joan Van Der Zande

Maxim Aleksandrovich Nasalevich

Willem-Pieter Voorthuijzen

Erik Achilles Abegg

Johannes Petrus Martinus Bernardus Vermeulen

Erik Roelof Loopstra

Martinus Hendrikus Antonius Leenders

Frits Van Der Meulen

Robert Gabriël Maria Lansbergen

Jeroen Dekkers

Aage Bendiksen

Gerrit Van Den Bosch

Jérôme François Sylvain Virgile Van Loo

Maarten Mathijs Marinus Jansen

Marc Bruijn

Jorge Manuel Azeredo Lima

Ronald Harm Gunther Kramer

Pradeep Kumar Govil

Dennis De Graaf

Robertus Cornelis Martinus De Kruif

Daniel Andrew Smith

Joseph Harry Lyons

Aleksandar Nikolov Zdravkov

Gijsbert Rispens

Angelo Cesar Peter De Klerk

Nadja Schuh

Mohammad Reza Kamali

Michiel Alexander Blauw

Silvester Matheus Reijnders

Nirupam Banerjee

Antonius Willem Verburg

Claudia Piliego

Nicolae Maxim

Anne Johannes Wilhelmus Van Lievenoogen

Frank Johannes Christiaan Theuerzeit

Geert Middel

Michel Loos

Roland Jacobus Johannes Kerstens

Maurice Leonardus Johannes Janssen

Jacobus Maria Dings

Stephen Roux

Richard Joseph Bruls

Andrey Alexandrovich Nikipelov

Matthew Lipson

Egbert Lenderink

Erik Willem Bogaart

Sandra Van Der Graaf

Sander Van Den Heijkant

Pawel Safinowski

Martinus Jozef Maria Kester

Theodorus Marinus Modderman

Laurentius Cornelius De Winter

Luigi Scaccabarozzi

Pieter Renaat Maria Hennus

Manish Ranjan

Joshua Adams

Ilya Malakhovsky

Andrew Judge

Richard Jacobs

Johannes Charles Adrianus Van Den Berg

Florian Didier Albin Dhalluin

Ludolf Postma

Pedro Julian Rizo Diago

Juan Diego Arias Espinoza

Veera Venkata Narasimha Narendra Phani Kottapalli

Xugang Xiong

Henricus Marinus Theodorus Wiersma

Marina Antoinetta Leonarda Van Uum-van Herk

Mike Johannes Antonius Van Kuijk

Bartel Joris Van Der Veek

Wouter Van Der Chijs

Marcel Duco Snel

Jan Willem Adriaan Oosterling

Joffrey Rene Sylvian Craquelin

Amoud Willem Notenboom

Martinus Jozef Maria Kesters

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Membrane for EUV lithography

An object handling apparatus for handling a generally planar object, the object handling apparatus including: two support arms, at least one of the two support arms movable relative to another support arm generally in a plane such that the two support arms are operable to grip and hold an object disposed in the plane, wherein each of the support arms includes at least one support pad and at least one aligner, the support pads configured to locally contact a surface of the object and apply a force thereto generally perpendicular to the plane so as to support the object and the at least one aligner configured to locally contact a surface of the object and apply a force thereto generally in the plane so as to grip the object.

Apparatus for assembly of a reticle assembly

An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.

Inspection apparatus

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

Pellicle and pellicle assembly

An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

Apparatus and method for determining a condition associated with a pellicle

A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Mask assembly and associated methods

An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber includes a first parking position and a second parking position for temporarily storing the object.

A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.

Membrane assembly

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Pellicle attachment apparatus

Growing community of inventors

Herentals, Belgium

Derk Servatius Gertruda Brouns