Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Trumpf Lasersystems for Semiconductor Manufacturing Gmbh

Siemens Healthineers Nederland B.v.

Derk Jan Wilfred Klunder

Maarten Marinus Johannes Wilhelmus Van Herpen

Vadim Yevgenyevich Banine

Levinus Pieter Bakker

Toon Hendrik Evers

Johannes Hubertus Josephina Moors

Joannes Baptist Adrianus Dionisius Van Zon

Vladimir Vitalevitch Ivanov

Ron Martinus Laurentius Van Lieshout

Wouter Anthon Soer

Johannes Joseph Hubertina Barbara Schleipen

Maarten Marinus Johannes Wilhelm Van Herpen

Josephus Arnoldus Henricus Maria Kahlman

Hendrik Roelof Stapert

Carolus Ida Maria Antonius Spee

Mikhail Mikhaylovich Ovsyanko

Niels Machiel Driessen

Jeroen Hans Nieuwenhuis

Olav Waldemar Vladimir Frijns

Konstantin Nikolaevitch Koshelev

Bastiaan Theodoor Wolschrijn

Marius Iosif Boamfa

Johannes Christiaan Leonardus Franken

Theodorus Petrus Maria Cadee

Frank Jeroen Pieter Schuurmans

Sjoerd Stallinga

Wilhelmus Josephus Box

Anke Pierik

Ruud Antonius Catharina Maria Beerens

Martin Lambert

Vladimir Mihailovitch Krivtsun

Hendrikus Gijsbertus Schimmel

Arnoud Cornelis Wassink

Mandeep Singh

Fabrizio Evangelista

Harm-Jan Voorma

Koen Van Ingen Schenau

Dominik Marcel Vaudrevange

Frank B Sperling

Kurt Gielissen

Richard Joseph Marinus Schroeders

Paul Peter Anna Antonius Brom

Peter Cornelis Zalm

Tolga Ergin

Stefan Michael Bruno Bäumer

Johannes Maria Freriks

Wilhelmina Maria Hardeman

Andrey Sergeevich Tychkov

Stefan Piehler

Maarten Van Herpen

Cornelis Cornelia De Bruijn

Sonia Margart Skelly

Josephus Arnoldus Hendricus Maria Kahlman

Kim Van Ommering

Jiayue Yuan

Nico Johannes Antonius Hubertus Boonen

Joannes Baptist Andrianus Dionisius Van Zon

Marcello Balistreri

Maarten Marinus Johannes Wilhelm Herpen

Marcello Leonardo Mario Balistreri

Henk Van Houten

Antonius Maria Bernardus De Mol

Maarten Marinus Johannes W Van Herpen

Andreas Kristian Hopf

Manisha Ranjan

Jasper Witte

The invention relates to a method and a sensor device () for evaluating an assay with a sample. During the assay, optical measurements are made at a sensing surface (), and at least one 'homogeneity-image' of the sensing surface () is generated. From this image, an “homogeneity-indicator” is determined for at least one region of interest, and the optical measurements are then evaluated in dependence on said indicator. The homogeneity-indicator may for example be a binary value which indicates if an inhomogeneity was detected or not. If an inhomogeneity was detected, all optical measurements may be rejected, only measurements for the involved region of interest may be rejected, or measurements for a selected sub-area of the involved region of interest (ROI) may be rejected.

Evaluating assays with optical inhomogeneities

A laser focusing system () for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror () configured to receive a laser beam from a beam delivery system () and generate a first reflected laser beam (); •—a second curved mirror () configured to receive the first reflected laser beam () and generate a second reflected laser beam (), wherein the laser focusing system () is configured to focus the second reflected laser beam () to a target location () in a vessel () of the EUV radiation source ().

Laser focussing module

The invention relates to detection the presence of a target molecule in a sample, wherein the sample is contacted with a substrate, the substrate subsequently being washed in a wash step. In particular, the invention relates to a method of detecting the presence of a target molecule in a sample, the method comprising: (a) contacting the sample () with a substrate having immobilized thereon probe molecules that specifically binds to the target molecule; (b) washing the substrate () in a wash step by a wash fluid in order to remove or dilute unbound target molecules; (c) detect the presence of resultant binding complexes () on the substrate to determine whether the target molecule is present in the sample&#x2014;The wash fluid being substantially refractive index matched to the substrate.

Detecting target molecules in a sample

During an assay, optical measurements are made at a sensing surface (), and at least one 'homogeneity-image' of the sensing surface () is generated. From this image, an 'homogeneity-indicator' is determined for at least one region of interest, and the optical measurements are then evaluated in dependence on said indicator. The homogeneity-indicator may for example be a binary value which indicates if an inhomogeneity was detected or not. If an inhomogeneity was detected, all optical measurements may be rejected, only measurements for the involved region of interest may be rejected, or measurements for a selected sub-area of the involved region of interest (ROI) may be rejected.

Concurrently evaluating assays with optical inhomogeneities

The invention relates to detection the presence of a target molecule in a sample, wherein the sample is contacted with a substrate, the substrate subsequently being washed in a wash step. In particular, the invention relates to a method of detecting the presence of a target molecule in a sample, the method comprising: (a) contacting the sample () with a substrate having immobilized thereon probe molecules that specifically binds to the target molecule; (b) washing the substrate () in a wash step by a wash fluid in order to remove or dilute unbound target molecules; (c) detect the presence of resultant binding complexes () on the substrate to determine whether the target molecule is present in the sample. The wash fluid being substantially refractive index matched to the substrate.

A substance determining apparatus determines a substance within a fluid where particles, which have attached the substance, are bound to a binding surface. A sensing unit is configured to generate a sensing signal being indicative of at least one of i) a distance between the particles bound on the binding surface and the binding surface, and ii) an in-plane position of the particles bound on the binding surface. A binding discrimination unit is configured to discriminate between different kinds of binding of the particles bound on the binding surface depending on the generated sensing signal. The binding discrimination unit may be a unit for determining the part of the sensing signal being caused by specifically bound particles and for determining the substance based on this determined part of the sensing signal.

Substance determining apparatus

The invention relates to a substance determining apparatus () for determining a substance within a fluid. A location event determination unit () determines location events indicating that a particle, which may have attached the substance, is located in a sensing region and a property of the location events from the sensing signal generated by sensing the sensing region. A location events selection unit () selects a part of the location events having a property in a predefined property range, and a substance determination unit () determines the substance within the fluid () based on the selected part of the location events. This allows tuning the determination of the substance within the fluid to a desired property range, which can relate to a desired kind of bound particles, thereby reducing the influence of unwanted effects on the determination of the substance and, thus, improving the determination accuracy.

A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode () provided on a face () of a semiconductor substrate () towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material () being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material () is provided on a side () of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.

Lithographic apparatus, sensor and method

The invention relates to a substance determining apparatus for determining a substance within a fluid. Particles attach the substance and bind to a binding surface (), wherein a sensing signal is generated depending on the bound particles. Binding events indicating a binding of a particle on the binding surface () are determined from the generated sensing signal, and the substance within the fluid is determined based on the determined binding events. During a procedure of determining a substance within a fluid, particles may bind to the binding surface and may leave the binding surface. Therefore, during this procedure a number of binding events can be determined being much larger than the number of bound particles. The determination of the substance within the fluid can therefore be based on a very large amount of data, thereby increasing the accuracy of determining the substance within the fluid.

A biosensor system for the detection of particles includes a biosensor cartridge having a sensor surface. A biosensor magnet assembly is disposed on one side of the cartridge for generating a magnetic field effective at the cartridge and the sensor surface. The biosensor magnet assembly includes at least two magnetic sub-units separated by a gap. A first optical detection system detects the particles arranged at the same side of the cartridge as the magnet assembly. The magnet assembly and the first optical sensor are disposed such that the optical detection is accomplished through the gap of the magnet assembly.

Biosensor system for single particle detection

The invention relates to real-time array PCR cartridges. The cartridge () has a fluid chamber () for a fluid bath () and a first support element () for fixing a microarray () in the fluid chamber (). Thereby the first support element () fixes the microarray () in such a way that a change of a size of the microarray () due to thermal expansion of the microarray () is possible without inducing substantial mechanical stress to the cartridge (). Thereby the cartridge materials chosen independently from thermal expansion coefficients of different microarrays that are to be inserted and fixed into the cartridge ().

Cartridge for an amplification process

An illumination detection system includes an excitation radiation source and associated radiation processing arrangement for focusing the excitation radiation from the radiation processing arrangement onto an analysis region of a sample. A radiation collection arrangement collects radiation from the analysis region of the sample resulting from the excitation, and a detector detects the collected radiation. The focused excitation radiation includes an excitation line which is evanescent in the sample. This combines the advantages of line scanning (reduced analysis time) and evanescent excitation (reduced background signal) and therewith enables increase measurement speed and precision for point of care application.

Molecular diagnostic system based on evanescent illumination and fluorescence

A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range.

Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

The invention relates to a device () for detection of excitation () using a multiple spot arrangement (), in which a multiple spot generator () is matched to the multiple spot arrangement () in such a way that light () entering the multiple spot generator () will be guided to defined areas on the multiple spot arrangement ().

Device for detection of excitation using a multiple spot arrangement

Growing community of inventors

Geldrop, Netherlands

Derk Jan Wilfred Klunder