Kulicke and Soffa Industries, Inc.

Kulicke & Soffa Liteq B.v.

Derk Andre Kort

Adrianus Johannes Petrus Maria Vermeer

Mikhail Yurievich Loktev

Mikhail Yurlevitch Loktev

Adrianus Johannes Verneer

A correction mask for an optical beam homogenizer includes a lens array. The correction mask is configured to provide a shaped initial beam profile. A subset of a plurality of optical paths between the incoming light beam and the illumination plane is at least partially blocked by the correction mask to provide a further homogenized beam profile having a further reduced light intensity variance with respect to an initial homogenized beam profile. The mask includes a plurality of submasks arranged according to a mask grid layout matching the lens grid layout of the lens array. Each one of the submasks is designed with a specific submask pattern to shape the respective subarea of the initial beam profile passing a specific one of the lenslets.

Optical beam homogenizer based on a lens array

A diffuser system () and method for optically diffusing a light beam (L,L). At least two transmissive diffuser windows () are provided. The diffuser windows () are arranged to sequentially diffuse the light beam (L,L) transmitted there through. The diffuser system () is configured to continuously rotate the diffuser windows () at an angular velocity (&#x3c9;) for homogenizing a diffusive pattern of the transmitted light beam (L,L). The diffuser windows () are configured to rotate around distinct rotation axes (C,C). The distinct rotation axes (C,C) are parallel and offset with respect to each other by a radial center distance (d). A rotating subarea of the first diffuser window () partially overlaps a rotating subarea of the second rotating diffuser window () The partially overlapping rotating subareas define a beam window (W) for homogenizing and diffusing the transmitted light beam (L,L).

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Eindhoven, Netherlands

Derk Andre Kort