Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Az Electronic Materials (japan) K.k.

Az Electronic Materials (korea) Ltd.

Deok-Man Kang

Hi-Kuk Lee

Jae-young Choi

Sang-Hyun Yun

Sae-Tae Oh

Min-Soo Lee

Jeong-Min Park

Cha-Dong Kim

Jung-In Park

Woo-Seok Jeon

Doo-Hee Jung

Youn-Suk Kim

Si-Young Jung

A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.

Photoresist composition and method of manufacturing array substrate using the same

A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. andR1 is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 4 carbons, an alkenyl group having 2 to 4 carbons, a cycloalkyl group having 3 to 8 carbons, and an aryl group having 6 to 12 carbons, and R2 is selected from the group consisting of Cl, F, Br, and I.

Photoresist composition and method of forming pattern by using the same

A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. The acryl resin makes up about 1% to about 15% of the total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.

Photoresist composition and method of manufacturing a thin-film transistor substrate using the same

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Deok-Man Kang