Applied Materials, Inc.

Dennis Zvalo

John M White

Shinichi Kurita

Suhail Anwar

Makoto Inagawa

Dong-Kil Yim

Jozef Kudela

Hans Georg Wolf

Ikuo Mori

The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.

Vertical inline CVD system

Growing community of inventors

Santa Clara, CA, United States of America

Dennis Zvalo