Ut-battelle, Inc.

Lambda Technologies, Inc.

Other

Denise A Tucker

Zakaryae Fathi

Robert J Lauf

Jianghua Wei

Richard S Garard

Howard M Reisner

Roger L Lundblad

Henry Shannon Kingdon

A microwave heating apparatus designed to allow concentration of microwave power to a liquid sample to be processed, by use of a field-perturbing tool disposed within or proximate to the volume of liquid. Uniformity of processing is achieved by circulating the liquid past the tool during processing. The apparatus and method is particularly useful when used to excite a nonlinear process whereby greater overall process efficiency may be achieved.

Apparatus and method for microwave processing of liquids

Virus attenuation is performed on a lyophilized biotherapeutic sealed within a microwave permeable container without harming the biotherapeutic and without exposing the biotherapeutic to additional viruses, by subjecting the container and biotherapeutic therewithin to variable frequency microwave energy. The container and biotherapeutic therewithin are swept with at least one range of microwave frequencies. Each range of microwave frequencies has a central frequency selected to break apart helix strands of a nucleic acid of the virus, to modify a capsid enclosing a nucleic acid of the virus, or to selectively couple to water molecules inside the capsid without harming the biotherapeutic or the container.

Biotherapeutic virus attenuation using variable frequency microwave energy

A variable frequency microwave heating apparatus designed to allow modulation of the frequency of the microwaves introduced into a multi-mode microwave cavity for heating or other selected applications. A field-perturbing tool is disposed within the cavity to perturb the microwave power distribution in order to apply a desired level of microwave power to the workpiece.

Apparatus and method for microwave processing of materials using field-perturbing tool

Rapid curing of polymer layers on semiconductor substrates is facilitated using variable frequency microwave energy. A semiconductor substrate having a polymer layer thereon is placed in a microwave furnace cavity, and then swept with a range of microwave frequencies. The range of frequencies includes a central frequency selected to rapidly heat the polymer layer. The range of frequencies is selected to generate a plurality of modes within the cavity. The sweep rate is selected so as to avoid damage to the semiconductor substrate and/or any components thereon. The microwave power may be adjusted during frequency sweeping to control the temperature of the polymer layer and the semiconductor substrate. Effluent produced during the curing of the polymer layer may be removed from the furnace cavity. The extent of cure of the polymer layer may be determined by detecting power reflection for each microwave frequency within the range to provide power reflection data, and then comparing the power reflection data with a predetermined set of power reflection data.

Growing community of inventors

Raleigh, NC, United States of America

Denise A Tucker