Analog Devices,inc.

Denis J Doyle

David J Clarke

Denis Ellis

Seamus Paul Whiston

Brian Anthony Moane

Michael G Tuthill

Michael P Daly

Kieran K Heffernan

Oliver James Brennan

Kieran Nunan

Liam Joseph White

Michael Anthony O'Neill

Mike O'Shea

Keith A Moloney

Thomas J Lawlor

A method for erasing an EEPROM cell which reduces the need for monitoring algorithms. The potential at the erase gate is initially raised and the potential at the control gate is lowered to cause FN tunneling through the erase gate. A subsequent soft programming step is employed to raise the potential at the control gate to a value sufficient to cause FN tunneling to start though the oxide of the transistor. A new memory device structure suitable for practicing this method employs a transistor having a floating gate, where a data value is stored as charged on the floating gate; a control gate; a control gate capacitor coupling the control gate to the floating gate; an erase gate; an erase gate capacitor coupling the erase gate to the floating gate; and an erase control circuit.

Method of erasing an EEPROM device

A semi-fusible link system and method for a multi-layer integrated circuit including active circuitry on a first layer having a metal one layer including a semi-fusible link element on a second layer having a metal two layer adapted for interconnecting with the metal one layer, and a selector circuit disposed on the first layer.

Semi-fusible link system for a multi-layer integrated circuit and method of making same

A programmable read only memory includes a matrix of semi-fusible link memory cells, each including a semi-fusible link having an intact impedance and a blown impedance; a bit line voltage supply switching circuit for applying a current to at least one selected bit line; a word line address decoder for selecting a word line; and a program control logic circuit for blowing the semi-fusible links in the memory cells identified by the intersection of the selected word and bit lines; a method is disclosed of testing programmed and unprogrammed read only memory.

Programmable semi-fusible link read only memory and method of margin testing same

An electronic programmable read-only-memory (EPROM) is provided having a field effect transistor with the gate electrode thereof coupled to a capacitor adapted to store charge produced in a channel region of the transistor in response to a logic state programming voltage applied between one of the source and drain regions and the gate electrode. The field effect transistor and the capacitor are formed in a common semiconductor body along with CMOS transistors. The field effect transistor has relatively heavy doped source and drain regions separated by an oppositely doped channel region. A gate electrode is disposed over the channel region. Lightly doped regions, having the same conductivity type as the source and drain regions, extend laterally from the source and drain regions to peripheral regions of the channel region to suppress generation of &ldquo;hot&rdquo; electrons in the transistor and the CMOS transistors. Relatively heavy doped regions are selectively formed in the field effect transistor of the EPROM are inhibited from being formed in the CMOS transistors. The relatively heavy doped regions have the same conductivity type as the source and drain regions and extending laterally from the source and drain regions, through and beyond the lightly doped regions, into the channel region. The additional, heavily doped regions are formed when heavily doped ESD regions are formed for diodes coupled to contact pads to prevent electrostatic discharge effects from harming the devices.

Electronic programmable read-only-memory including a charge storage capacitor coupled to the gate electrode

An input protection device is provided for protecting a circuit structure which is coupled to a first node, the device comprising a first lightly-doped region of P-type material with a lightly doped well of N-type material formed in it. Two regions of heavily doped N-type and P-type material, which are electrically connected to the first node, are formed in the well of N-type material. A third heavily doped region of N type material is formed in the first lightly-doped region of P-type material and is electrically connected to a reference node. In a first aspect of this invention, the third heavily doped region of N type material is formed in a second well of N-type material, which in turn is formed in the first lightly-doped region of P-type material. In this first aspect of the invention a further region of heavily doped P-type material is formed in the second well of N-type material, this further region of heavily doped P-type material being electrically connected to the reference node. In a second aspect to the invention, a further region of heavily doped P-type material is formed in the first lightly-doped region of P-type material. In a third aspect to the invention, the third heavily doped region of N type material is formed in a second well of N-type material, which in turn is formed in the first lightly-doped region of P-type material. In this third aspect of the invention a further region of heavily doped P-type material is formed in the second well of N-type material, this further region of heavily doped P-type material being electrically connected to the reference node, with a further region of heavily doped P-type material formed in the first lightly-doped region of P-type material. Accordingly, an input protection device for protecting pins of an integrated circuit is described having both bipolar and unipolar characteristics. The input protection device may be constructed as a discrete device or as part of an integrated circuit and provides for breakdown voltages in excess of a supply voltage to an integrated circuit. The characteristics, in particular the breakdown voltage, of the input protection device are alterable by adjusting its layout, in contrast to a known method of altering such characteristics by altering doping levels.

SCR cell for electrical overstress protection of electronic circuits

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Patrickswell, Ireland

Denis J Doyle