Materion Gmbh

Dejan Stojakovic

Xingbo Yang

Arthur V Testanero

Matthew J Komertz

Longzhou Ma

Methods for making a high purity (&#x3e;99.99%) and low oxygen (&#x3c;40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X=B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.

Cobalt, iron, boron, and/or nickel alloy-containing articles and methods for making same

Methods for finishing a sputtering target to reduce particulation and to reduce burn-in time are disclosed. The surface of the unfinished sputtering target is blasted with beads to remove machining-induced defects. Additional post-processing steps include dust blowing-off, surface wiping, dry ice blasting, removing moisture using hot air gun, and annealing, resulting in a homogeneous, ultra-clean, residual-stress-free, hydrocarbon chemicals-free surface.

Methods for surface preparation of sputtering target

Methods for making a high purity (&#x3e;99.99%) and low oxygen (&#x3c;40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X&#x2550;B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.

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Danbury, CT, United States of America

Dejan Stojakovic