Laser Photonics Technology Inc.

Applied Materials, Inc.

Deepak N Kumar

Dale R Tyczka

Ryszard Burzynski

Saswati Ghosal

Thomas H Osterheld

Wei-Yung Hsu

Huanbo Zhang

Anand N Iyer

Benjamin A Bonner

Christopher W Smith

Yong-Sik R Kim

New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.

Holographic recording material

Methods and compositions are provided for planarizing a substrate surface with reduced or minimal defects in surface topography. In one aspect, a method is provided for processing a substrate including positioning a substrate comprising at least first dielectric material and second dielectric material disposed thereon in a polishing apparatus, polishing the substrate with a first polishing composition having a first selectivity, and polishing the substrate with a second polishing composition having a second selectivity greater than the first selectivity.

Methods and compositions for chemical mechanical polishing shallow trench isolation substrates

Growing community of inventors

Sunnyvale, CA, United States of America

Deepak N Kumar