Universiteit Gent

Katholieke Universiteit Leuven

Davy Deduytsche

Christophe Detavernier

Johan Adriaan Martens

Sreeprasanth Pulinthanathu Sree

Amit Kumar Roy

Johan Haemers

Johan Martens

A system for combinatorial deposition of a thin layer on a substrate is described. The system comprises at least one deposition material source holder and a substrate holder. The system also comprises a rotatable positioning system for subsequently positioning the at least one substrate in parallel and in non-parallel configuration with at least one deposition material source. The system comprises at least one mask holder arranged for positioning a mask between at least one of the target holder and the positioning system, for allowing variation of the material flux across the at least one substrate when the combinatorial deposition is performed. The mask holder is in a fixed arrangement with respect to the at least one deposition material source holder during the combinatorial depositing.

Deposition tool for combinatorial thin film material libraries

A method is described for providing a hydrophilic effect to a fluoropolymer, e.g. polytetrafluoroethylene (PTFE) material. The method comprises obtaining an at least partly hydrophobic fluoropolymer material, applying a plasma and/or ozone activation step and depositing an inorganic coating using an atomic layer deposition process. Plasma activation step and/or said atomic layer deposition process thereby comprises using process parameters determining a high interaction probability between one or more precursors for the atomic layer deposition process and the fluoropolymer material so as to obtain a coated fluoropolymer material having a contact angle with water below 30&#xb0;.

Methods for obtaining hydrophilic fluoropolymers

The present invention relates to the use of atomic layer deposition (ALD) techniques to enhance the acid catalytic activity of nanoporous materials.

Enhancing catalytic activity of nanoporous materials

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De Pinte, Belgium

Davy Deduytsche