Micron Technology Incorporated

Davis Weymann

Rajasekhar Venigalla

Kevin Lee Baker

Patrick M Flynn

Efe Sinan Ege

Tao D Nguyen

Josiah Jebaraj Johnley Muthuraj

Methods, systems, and devices for a low resistance crosspoint architecture are described. A manufacturing system may deposit a thermal barrier material, followed by a first layer of a first conductive material, on a layered assembly including a patterned layer of electrode materials and a patterned layer of a memory material. The manufacturing system may etch a first area of the layered assembly to form a gap in the first layer of the first conductive material, the thermal barrier material, the patterned layer of the memory material, and the patterned layer of electrode materials. The manufacturing system may deposit a second conductive material to form a conductive via in the gap, where the conductive via extends to a height within the layered assembly that is above the thermal barrier material.

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Boise, ID, United States of America

Davis Weymann