Phase Four, Inc.

David Tsai

Derek William Thompson

Mohammed Umair Siddiqui

An electrothermal plasma production device is presented. The plasma production device includes: a plasma production chamber; an RF antenna external to the plasma production chamber; a propellant tank and flow regulator external to the plasma production chamber and in communication with the plasma production chamber; and a plenum disposed between the propellant tank and the plasma production chamber. The RF antenna, in combination with an AC power source, is configured to provide an RF energy to an interior region of the plasma production chamber and to an interior region of the plenum with sufficient power to ionize at least some of the propellant in the plenum. The plasma production chamber is configured to include a propellant injector for receiving propellant at a first closed end of the plasma production chamber.

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EL SEGUNDO, CA, United States of America

David Tsai