Applied Materials, Inc.

David Santi

Dien-Yeh Wu

Kai Wu

Jallepally Ravi

Zubin Huang

Mark S Johnson

Hyman Lam

Peiqi Wang

Mohammed Jaheer Sherfudeen

A method of forming a tungsten-containing layer over a substrate includes a) positioning a substrate on a substrate support in a process volume of a process chamber; b) providing a precursor gas to the process volume of the process chamber for a first duration; and c) providing a tungsten-containing gas to the process volume of the process chamber by opening a pulsing valve on a tungsten-containing gas delivery line for a second duration occurring after the first duration to form a tungsten-containing layer on the substrate. The tungsten-containing gas delivery line includes a first section connected to an inlet of the pulsing valve and a second section connected to an outlet of the pulsing valve, the first section connects the inlet of the pulsing valve to a reservoir of tungsten-containing gas, the second section connects the outlet of the pulsing valve to an inlet of the process chamber.

Gas delivery for tungsten-containing layer

Disclosed herein are embodiments of a value assembly, methods of manufacturing the same, and methods of using the same. In one embodiment, a sensor assembly comprises a housing having a through-bore, a first flap coupled to a first shaft and a second flap coupled to a second shaft, wherein the first shaft and the second shaft are coupled within the housing; and one or more gear assemblies coupled to the first shaft and the second shaft, wherein the gear assemblies are configured to rotate the first flap and the second flap from a first position to a second position to prevent a flow from traversing through the through-bore, and from the second position to the first position to allow the flow to traverse through the through-bore.

Method and mechanism for symmetrically controlling pressure in process chamber

Disclosed are apparatus and methods for supplying a constant flow of precursor gas to a processing chamber. The apparatus described, and methods of use, allow a precursor ampoule to be removed from the gas delivery system without interrupting the process.

Processing chamber gas delivery system with hot-swappable ampoule

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San Mateo, CA, United States of America

David Santi