Prometrix Corporation

David S Perloff

Leslie A Lane

Chester L Mallory

Lynn V Lybeck

Shoji Kumagi

Hung V Pham

Sandor Droblisch

Alexander Freedland

Michael K Baker

A data analysis computer system stores measurement data obtained from a multiplicity of distinct predefined processes. The system can store definitions for many data analysis charts, each of which depicts stored measurement data for a specified process. Further, chart groups can be defined. Each chart group comprises a set of data analysis charts that grouped together for convenient access. Charts are displayed by either (1) selecting a defined chart, or (2) by selecting a chart group and then selecting one or more charts from the selected group for, and then simultaneously displaying the selected data analysis charts. A data display gallery feature divides the computer system's display into a two dimensional array of cells, and assigns cell definitions to at least a subset of the cells. Each cell definition consists of either a set of measurement data which can be displayed as a unit, or a mathematical combination of a plurality of specified sets of measurement data. Typically each displayed cell contains a data map depicting a set of data in accordance with a corresponding cell definition. Each displayed data analysis chart is displayed with an expand bar having two ends and a expansion selection element positioned therebetween. The expansion element can be moved to various positions along the expansion bar, and the system responds by scaling each data analysis chart in accordance with the position of the expansion selection element. This allows the user to quickly re-scale each data analysis chart to the user's liking.

Data analysis system and method for industrial process control systems

A system and method for computer control of machine processes. The system and method provide a set of predefined data management or data analysis tasks which an operator of the system can use when using the system to run a selected process. Measurement data structures for storing data measured during the running of processes, and related data, for a multiplicity of processes are defined and stored. Data is added to these data structures each time a process is run, and this data is automatically accessed when the operator requests data analysis on the data collected during previous uses of a selected process. Access to measurement data for detailed data management tasks is provided graphically through the use of trend charts and statistical quality control charts. These charts depict trends in the measurement data for selected processes. By pointing at any data point in the chart, the user can access the corresponding record of data for detailed data analysis or for use in a data management task.

Process control interface system for managing measurement data

A method of selecting items from a hierarchy of items and then performing a selected task on the selected set of items. An engineering set up control program includes a procedure for denoting processes, groups of processes, and subgroups of processes which are available for use by operators of the system. The processes, groups and subgroups are visually presented in a three level menu. Subgroups and groups of processes can be selected using the three level menu, and then operated on as a group.

Multilevel menu and hierarchy for selecting items and performing tasks

A system and method for computer control of machine processes. The operator of the system selects and specifies process control parameters through the use of a three level dynamic menu. The first level of the menu is used to select a group of process parameters. The second and third menus together have the visual appearance of a set of index cards, the second menu forming tabs on the index cards, and the third menu comprising the set of process parameters listed on each index card. Each process parameter has a preassigned entry status: operator unalterable, operator alterable, forced operator entry, or single time forced entry (value must be entered only once when the process is run several times). The selected process cannot be run until values have been entered for all parameters having an entry status of forced operator entry or single time forced entry. Edit field parameters limit the operator's options to a predefined set of parameter values. Edit field parameters are also used to specify complicated parameter values having a multiplicity of subparameter values. The defination of each process can include a measurement data structure which defines measurement data to be collected during the running of the process. The measurement data to be collected is specified by specifying a set of data analysis tasks, and specifying the measurement data needed for each data analysis task. The measurement data structure includes definitions of the specified data analysis tasks and the measurements to be collected.

Process control interface with simultaneously displayed three level

A process control interface includes a multi-level dynamic menu for selecting processes from a set of processes that are organized into groups and subgroups. An engineering set up control program enables an engineer to denote which of these groups, subgroups and processes are available for selection by an operator using the process control interface. Only those groups, subgroups and processes which are available for selection are displayed in the dynamic menu. The set of processes defined by the engineering set up control program can be stored on individual operator-related disks so that each operator has access to a distinct set of available processes. Process subgroups and groups can be duplicated by the engineering setup control program to facilitate the setting up of new control processes. In addition, the engineering set up control program can denote parameters used by a process as required entry parameters, fixed value parameters, operator alterable parameters, and single forced entry parameters--the latter being parameters which must be assigned a value only the first time that a process is run.

Multi-level dynamic menu which suppresses display of items previously

A method of controlling a process using a programmed digital computer with a set of process control programs. An operator control program allows the user to select and run a specified process and to collect measurement data while the selected process is run. A data analysis program enables interactive computer controlled data analysis, including displaying a trand chart depicting a sequence of data points, each data point representing at least a portion of the measurement data collected and stored while running a selected process. A selectably positionable pointer is displayed on the trend chart for pointing at an individual data point so that the user can select and perform a predefined task on the measurement data stored in the data structure corresponding to the data point being pointed at by said selectably positionable pointer.

An automatic system for performing sheet resistivity testing on surface layers of semiconductor wafers, including a wafer handling stage having a platform for carrying a semiconductor wafer, and an arrangement for mounting the platform for rotation about a central axis and for translation of the platform orthogonal to a major surface thereof. A platform drive translates the platform between a wafer test position and a wafer load position, and a stage drive rotates the platform to accurately located angular test positions. A probe handling arrangement includes a carriage for carrying a test probe parallel to the major surface of a wafer on the platform and a carriage drive translates the carriage between a parked position in which a test prove thereon is positioned adjacent and clear of the platform and accurately located test positions along a radius of the platform. The carriage carries a resistivity test probe which includes test probe element for contacting the surface of a semiconductor wafer. A light tight housing surrounds the platform and includes an access door therein facing the platform and positioned intermediate the wafer load position and the wafer test position of the platform. The access door translates under controlled motor drive between a closed position and an open position which permits the platform to translate between the wafer load and wafer test positions. Sensor arrangements cooperate with a safety inhibit circuit to preclude destructive movement of components when position conflict is sensed. All movements and measurements are under microcomputer control.

Apparatus and methods for semiconductor wafer testing

An automatic sheet resistance mapping system for semiconductor wafers which has the capability of taking high accuracy, multiple test readings in both contour scan and diameter scan modes. A rotatable wafer stage carries a semiconductor wafer thereon with the center of the wafer positioned substantially at the axis of rotation of the wafer stage. A probe head assembly, including a linear array of at least four equally spaced probe tips projecting from one surface of the assembly is mounted facing the wafer stage on an arrangement for moving the probe tips alternately into and out of contact with the surface of a wafer carried thereon. Positioning arrangements are provided for rotating the wafer stage to accurately registered angular test positions and for producing translation between the wafer stage and the probe head assembly to position the array of probe tips at accurately registered radial test positions relative to the center of the wafer. The positioning arrangements are operable in a diameter scan mode to locate the probe tips at a multiplicity of successive, closely spaced test positions along a diameter line of the wafer and are operative in a contour scan mode to locate the probe tips at a two-dimensional array of different positions across the area of the wafer. The mounting arrangement for the probe head positions the probe head in a prearranged alignment position with the linear array of probe tips oriented at a prearranged small acute angle to a radius line so that the test probe tips each define a track of separated test probe footprints on the wafer in the diameter scan mode.

Apparatus and methods for resistivity testing

A system and method for computer control of machine processes, including a dynamic menu feature used in the selection of processes and the definition and selection of operating parameters used by a process control program to direct the performance of the process by the machine. Data structures for a multiplicity of processes are defined and stored. Values stored in the data structures indicate which processes are available for use and the process control program associated with each process. Furthermore, for each parameter of each process a data structure contains an indicia of whether the parameter is a forced entry parameter (which must be given a value before the process is run), a may change parameter (with a default value that may be changed when the process is run), or a locked parameter which has a fixed value. An engineering set up program enables interactive computer controlled performance of the steps of storing the above-mentioned data structures, entry of values into the data structures, and the entry of default parameter values. An operator control program, utilizing the stored data structures, enables interactive computer controlled performance of the steps of selecting one of the enabled processes, entry of parameter values, and running of the selected process.

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Sunnyvale, CA, United States of America

David S Perloff