Mei, Inc.

Omnis Thermal Technologies, LLC

Omnis Advanced Technologies, LLC

Automation Technology, Inc.

David S Gibbel

Simon K Hodson

James S Swensen

Douglas Edward Grunder

Stephen P Gibbel

A continuous hydrocarbon pyrolysis process to produce hydrogen gas and carbon includes exposing a hydrocarbon feedstock to an oxygen depleted combustion gas within a hydrocarbon pyrolysis zone. A valveless pulse combustor produces the combustion gas at a temperature greater than 2,400° C. The hydrocarbon feedstock and combustion gas have a residence time within the hydrocarbon pyrolysis zone less than 30 seconds to cause pyrolysis of the hydrocarbon feedstock and produce gas comprising hydrogen and solid particles comprising carbon. The gas and solid particles exit the hydrocarbon pyrolysis zone at a temperature greater than 1,200° C. A heat exchanger cools the gas and solid particles to a temperature less than 200° C. A gas absorber removes unwanted gas molecules from the gas and produce Hcontaining gas having an Hconcentration greater than 80 vol. % H. The Hcontaining gas is continuously introduced to a Hconsuming facility.

Ultra-high temperature pyrolysis separation of hydrogen and carbon

A variable residence time drying system for moist material includes a valveless pulse combustor and a drying chamber. The drying chamber includes a lower sidewall with an upward expanding configuration that defines a lower inverted partial cone, an upper sidewall with an upward contracting configuration, a lifting rotor disposed within the lower inverted partial cone to suspend material being dried within a shear/drying zone, an opening through which moist material is fed into the drying chamber, and an exit located at a top portion of the drying chamber through which dried material exits the drying chamber. The valveless pulse combustor produces drying gas and sonic vibrations that are introduced tangentially into the shear/drying zone. One or more cyclones receive dried material and collect small particles. The lifting rotor may rotate in a direction counter to a direction in which the heated drying gas is introduced into the drying chamber.

Pulse combustion variable residence time drying system

A combustible pellet drying system includes a valveless pulse combustor and a drying column. The drying column includes a first drying region and optionally a second drying region. The first drying region receives heated drying gas from the pulse combustor to dry a quantity of moist pellets flowing downwardly through the drying column. Moisture-laden exhaust gas from the first drying region is processed by a condenser to remove water and recover thermal energy therefrom, and to produce a cooled dried exhaust gas which may be reheated by passing through a jacket around the pulse combustor. The reheated dry gas is introduced into the second drying region to further dry the pellets. The second drying region is preferably a downwardly expanding cone configuration. The drying column includes a plurality of temperature sensors. Adjacent temperature sensors may be used to determine a level of pellets within the drying column. The combustible pellets are preferably coal pellets.

Combustible pellet drying system

A coalescing dryer passes air downwardly through items to be dried in a container. The air can be diverted to change direction following passage of the air through the items to be dried. The moving air causes liquid on the surface of items to be dried to coalesce and travel downwardly and from the items being dried. A vacuum dryer applies a vacuum to the container of items to be dried when placed in a vacuum chamber after pre-drying by the coalescing dryer so as to evaporate liquid in the items to be dried that has not been removed by the coalescing dryer.

Liquid coalescence and vacuum chamber dryer system and method

Liquid coalescence and vacuum dryer system and method

Solar wafer clean systems, methods and apparatus capable of receiving wafer combs that have been treated with a wire-saw cutting device and providing final clean solar wafers while the wafers are on the beam (before or without any pre-cleaning) are disclosed. Embodiments of methods and apparatus produce clean solar wafers while attached to the beam without the need for a pre-clean step or tool. As such certain of the embodiments provide efficient and cost-effective cleaning of solar wafers on the beam that is also economically viable on a commercial scale.

Solar wafer cleaning systems, apparatus and methods

Wafers are separated individually from a stack by directing multiple jets of fluid between an outermost wafer in the stack and an adjacent wafer. The jets have sufficient pressure and are sufficiently spaced apart around the wafer stack to cause the outermost wafer to separate longitudinally from the adjacent wafer without lateral movement there between. In the illustrated embodiment, a chuck is attached to a planar surface of the outermost wafer. The attached wafer and wafer stack, once separated by the jet of fluid, are moved relatively apart, such as by movement of the chuck. The wafers in the stack are thereby separated without contact between a wafer edge and a solid object (such as a container wall or hand), minimizing the risk of wafer breakage.

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Falls City, OR, United States of America

David S Gibbel