Basf Aktiengesellschaft

Basf Se Corporation

David Redfern

Oliver Wagner

Bernhard Schuler

David Christie

Mubarik Mahmood Chowdhry

Henning Urch

Christian Rein

Hideki Yamashita

Neil Jeffrey Fitzmaurice

Graham Robert Orr

Cheeseng Yong

Gregory John Catterall

Jonathon Shane Allen

Roger Jan Van Sonsbeek

The present invention relates to a method of separating radioactive elements from a mixture, wherein the mixture is treated with at least one alkanesulfonic acid and at least one further acid, selected from the group consisting of hydrochloric acid, nitric acid, amidosulfonic acid and mixtures thereof and also the use of at least one alkanesulfonic acid and at least one further acid for separating radioactive elements from mixtures comprising these.

Removal of radionuclides from mixtures

The invention also relates to a method to increase stain resistance and penetration resistance of aqueous coating compositions which method comprises providing a coating composition which contain at least one pigment, at least one film-forming polymer in the form of an aqueous polymer dispersion and at least one anionic surfactant, wherein the anionic surfactant comprises at least 85% by weight, preferably at least 90% by weight, more preferably at least 95% by weight, based on the total weight of anionic surfactant in the coating composition, of at least one anionic surfactant S, which is selected from semi-esters of sulfuric acid or phosphoric acid with an alcohol, which alcohol carries at least one alkyl radical having from 8 to 30 carbon atoms or an alkyl substituted phenyl radical wherein alkyl has from 4 to 30 carbon atoms and which alcohol may carry an oligo-C-C-alkylene-ether group provided that the number of repeating units in the oligo-C-C-alkylene-ether group is at most 15, or a salt thereof.

Method to increase resistance against stain penetration of aqueous coating compositions

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Melbourne, Australia

David Redfern