Carl Zeiss Smt Gmbh

Carl-Zeiss-Smt Ag

Carl Zeiss Microscopy Gmbh

Kla Tencor Corporation

Other

Excimer Laser Systems

Litton Systems, Inc.

General Signal Corporation

Kla-Tencor Technologies Corporation

Carl Zeiss Industrielle Messtechnik Gmbh

Carl Zeiss Ag

Euv LLC.

Kla Instruments Corporation

David R Shafer

Wilhelm Ulrich

Hans-Juergen Mann

Alexander Epple

Aurelian Dodoc

Rudolf Von Buenau

Wolfgang Singer

Susanne Beder

Yung-Ho Alex Chuang

J Joseph Armstrong

Bin-Ming Benjamin Tsai

Karl-Heinz Schuster

Michael Totzeck

Tiemo Anhut

Matthias Wald

David J Elliott

Rolin J Gebelein

Artur Degen

Toralf Gruner

Ralf Wolleschensky

Russell M Hudyma

Hans-Juergen Dobschal

William C Sweatt

Daniel Kraehmer

Thomas Engel

Hwan J Jeong

Aksel Goehnermeier

Gregory Kirk

Markus Seesselberg

Jörg Siebenmorgen

Johannes Winterot

Marco Pretorius

Olaf Dittmann

Shiow-Hwei Hwang

Norbert Kerwien

Donald W Sweeney

Ian Powell

Steve R Lange

Dieter Bader

Richard F Hollman

James McGuire

Larry G Jones

Russel Hudyma

J Richard Anderson

James E Gibson

Vladimir Kamenow

Gerhart Fuerter

A refractive projection lens for imaging a pattern in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation of a mercury vapor lamp includes a multiplicity of lens elements are arranged along an optical axis between the object and image planes. The lens elements image a pattern in the object plane into the image plane with a reducing imaging scale. The lens elements include first lens elements made of a first material with a relatively low Abbe number and a second lens elements made of a second material with a higher Abbe number relative to the first material.

Projection lens, projection exposure apparatus and projection exposure method

A detection device for a microscope comprises a dispersive element in the beam path of light and a selection element. The selection element separates a beam path of a spectral portion of the light from the beam path of the light. The detector device furthermore comprises a focusing optical unit configured to focus the beam path of the spectral portion of the light onto a sensor. By way of example, the microscope may be a confocal microscope.

Detector device for detection of a spectral portion for a microscope

An apparatus for imaging a sample arranged in a first medium in an object plane. The apparatus includes an optical transmission system which images the sample in the object plane in an intermediate image in an intermediate image plane. The object plane and the intermediate image plane form an angle not equal to 90&#xb0; with an optical axis of the transmission system. The apparatus further comprises an optical imaging system having an objective. The object plane may be imaged on a detector without distortion. The optical transmission system is symmetrical with respect to a pupil plane, the object plane, and the intermediate image plane to satisfy the Scheimpflug condition. The intermediate image lies in a second medium having a refractive index virtually identical to that of the first medium. A lens group of a subsystem arranged closest to the sample or intermediate image comprises at least one catadioptric assembly.

Device for imaging sample

An arrangement for light sheet microscopy including illumination optics with an illumination objective for illuminating a sample, located in a medium on a sample carrier aligned with respect to a plane reference surface, with a light sheet. The arrangement also includes detection optics with a detection objective. The arrangement further includes a separating layer system with at least one layer separating the medium from the illumination and detection objectives. The separating layer system contacts the medium by a base surface aligned parallel to the reference surface. A correction lens system, with at least one correction lens serving to reduce those aberrations which occur as a result of the oblique passage of illumination light and/or of light to be detected through interfaces of the separating layer system, is arranged between illumination objective and separating layer system and/or between detection objective and separating layer system.

Arrangement for light sheet microscopy

A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.

Catadioptric projection objective with parallel, offset optical axes

An optical image offset device for compensating for or producing a lateral offset of an image of an observation object () in an optical observation device () is provided. The optical image offset device comprises at least two optical wedges () which are arranged successively along an optical axis (OA) and which are respectively composed of at least two optical elements (). Each optical wedge () has an adjustable wedge angle (&#x3b1;, &#x3b2;) Furthermore the optical wedges () have different refractive indices and different dispersions.

Optical image offset device, optical image stabilization device and optical observation apparatus

An imaging optical system has a plurality of mirrors, which via a beam path for imaging light, image an object field in an object plane into an image field in an image plane. The imaging optical system has an exit pupil obscuration. At least one of the mirrors has no opening for passage of the imaging light. The fourth to last mirror in the beam path is concave, resulting in an imaging optical system having improved imaging properties without compromise in throughput.

Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type

The invention relates to a telecentric modular zoom system for mapping an object plane on a sensor, in particular in a digital transmitted light microscope or incident light microscope having interchangeable lenses, comprising a fixed tube lens unit (LG) and multiple optical assemblies (LG, LG, LG, LG, LG), at least two of which are adjustably arranged relative to one another for the purpose of changing the magnification, characterized in that [sic]. According to the invention, a physical aperture (BL) conjugated relative to the rear focal points of the objectives used and having a variable diameter may be arranged in the beam path, wherein the rear focal points of the objective may be mapped in the space between a sensor image (BIE) and the intermediate image (ZB), the images of the rear focal points of the objectives (aperture BL) and the sensor image (BIE) do not lie within or migrate through the optical assemblies (LG, LG, LG, LG, LG, LG).

Telecentric modular zoom system

A measuring apparatus and method for determining dimensional characteristics of a measurement object use a sensor head in order to register desired measurement points on the measurement object. The sensor head comprises a polychromatic light source for generating light having various wavelengths of light, a spectrometer, and an optical system having at least one lens element. The optical system produces a first defined range of color dependent foci and a second defined range of color dependent foci in front of the at least one lens element. The spectrometer generates a first spectral information when the measurement object is in the first defined range, and it generates a second spectral information when the measurement object is in the second defined range. An evaluation unit exploits the first spectral range in a coarse measurement mode, and it exploits the second spectral range in a fine measurement mode.

Measuring apparatus and method for determining dimensional characteristics of a measurement object

In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.

Catoptric objectives and systems using catoptric objectives

An optical system may include an objective having at least four mirrors including an outermost mirror with aspect ratio &#x3c;20:1 and focusing optics including a refractive optical element. The objective provides imaging at numerical aperture &#x3e;0.7, central obscuration &#x3c;35% in pupil. An objective may have two or more mirrors, one with a refractive module that seals off an outermost mirror's central opening. A broad band imaging system may include one objective and two or more imaging paths that provide imaging at numerical aperture &#x3e;0.7 and field of view &#x3e;0.8 mm. An optical imaging system may comprise an objective and two or more imaging paths. The imaging paths may provide two or more simultaneous broadband images of a sample in two or more modes. The modes may have different illumination and/or collection pupil apertures or different pixel sizes at the sample.

Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths

An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.

Imaging optics, microlithography projection exposure apparatus having same and related methods

A catadioptric projection objective for imaging a pattern onto an image plane includes: a first objective part for imaging the pattern into a first intermediate image; a second objective part for imaging the first intermediate image into a second intermediate image; and a third objective part for imaging the second intermediate image onto the image plane. A first concave mirror having a continuous mirror surface and a second concave mirror having a continuous mirror surface are upstream of the second intermediate image. A pupil surface is formed between the object plane and the first intermediate image, between the first and the second intermediate image, and between the second intermediate image and the image plane. A plate having essentially parallel plate surfaces is positioned in the first objective part near the pupil surface. At least one plate surface is aspherized to correct for aberrations.

Catadioptric projection objective including an aspherized plate

A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D, a maximum image field height Y', and an image side numerical aperture NA; wherein COMP=D/(Y&#x2032;&#xb7;NA) and wherein the condition COMP&#x3c;10 holds.

Catadioptric projection objective

Growing community of inventors

Fairfield, CO, United States of America

David R Shafer