International Business Machines Corporation

David Paul Merritt

Wayne Martin Moreau

Robert Lavin Wood

Hiroshi Ito

Gregory Breyta

Ranee W Kwong

Harbans S Sachdev

William R Brunsvold

Daniel Joseph Dawson

Willard E Conley

Scott L Jacobs

Elwood Herbert Macy

Stanley E Perreault

George L Mack

Moahmoud Mostafa Khojasteh

Ann M Uptmor

A process for the stoichiometric carbonation of a hydroxyaromatic material is provided which comprises the steps of (a) mixing together in a reaction vessel (1) a hydroxyaromatic material, (2) a sufficient amount of a dialkyl dicarbonate to give the desired degree of substitution, (3) a catalytic amount of an unhindered tertiary amine, and (4) a solvent, (b) stirring the reaction mixture, (c) precipitating the alkyl carbonate of the hydroxyaromatic material, and (d) recovering the alkyl carbonate of the hydroxyaromatic material.

Process for forming carbonates of hydroxyaromatic compounds

Positive resists sensitive to UV, electron beam, and x-ray radiation which are alkaline developable are formulated from a polymer material comprising recurrent structures having alkaline soluble groups pendent to the polymer backbone, a portion of which groups are substituted with acid labile groups.

Highly sensitive positive photoresist composition

A composition for use in a process for the deposition of patterned thin metal films on integrated circuit substrates, the composition comprising an admixture of a thermoplastic polyimide resin and a coumarin dye dissolved in a substituted phenol solvent. Optionally a polar solvent having a boiling point greater than 160.degree. C. and a low boiling organic compound (70.degree.-150.degree. C.) may be incorporated in the composition.

Polyimide formulation for forming a patterned film on a substrate

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Cold Spring, NY, United States of America

David Paul Merritt