Qucor Pty Limited

David Norman Jamieson

Andrew Steven Dzurak

Robert Graham Clark

Lloyd Christopher Leonard Hollenberg

Steven Prawer

Changyi Yang

Eric Gauja

Mladen Mitic

Andrea Morello

Hans-Gregor Huebl

Laurens Henry Willems Van Beveren

Christopher Escott

Soren Andresen

Sean Hearne

Toby Felix Hopf

Eric Guaja

This invention concerns semiconductor devices of the general type comprising a counted number of dopant atoms () implanted in regions of a substrate () that are substantially intrinsic semiconductor. One or more doped surface regions () of the substrate () are metallized to form electrodes () and a counted number of dopant ions () are implanted in a region of the substantially intrinsic semiconductor.

Implanted counted dopant ions

This invention concerns a method and system for single ion doping and machining by detecting the impact, penetration and stopping of single ions in a substrate. Such detection is essential for the successful implantation of a counted number ofP ions into a semi-conductor substrate for construction of a Kane quantum computer. The invention particularly concerns the application of a potential across two electrodes on the surface of the substrate to create a field to separate and sweep out electron-hole pairs formed within the substrate. A detector is then used to detecting transient current in the electrodes, and so determine the arrival of a single ion in the substrate.

Method and system for single ion implantation

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Melbourne, Australia

David Norman Jamieson