Applied Materials, Inc.

Google Inc.

David Muquing Hou

James Omer L'Heureux

Zheng Yuan

Michael Santiago Cox

Rongping Wang

Jibing Zeng

Yan Rozenzon

Yew Jin Lim

Randolph Gregory Brown

James A Kunz

Ryan T Downey

Tao Feng

Beidou Wang

Kyle Zaragoza

Yi Li

Nikita Kirnosov

James L'heureux

Processor(s) of a client device can: analyze one or more features of an electronic resource that is under consideration for solicitation to a user; determine a notification likelihood that the user will access the electronic resource in response to an unsolicited notification of the electronic resource being output to the user; determine a baseline likelihood that the user will access the electronic resource without being solicited; compare the notification likelihood with the baseline likelihood; and cause, based on the comparing, the unsolicited notification to be output to the user. In some implementations, determining the notification likelihood and/or the baseline likelihood is based on applying data associated with the electronic resource as input across a machine learning model to generate output indicative of the notification likelihood and/or the baseline likelihood. In other implementations, determining the notification likelihood and/or the baseline likelihood is based on past behavior or preference(s) of the user.

Modeling lift of metrics for triggering push notifications

Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.

Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent

Embodiments disclosed herein include a plasma source, an abatement system and a vacuum processing system for abating compounds produced in semiconductor processes. In one embodiment, a plasma source includes a dielectric tube and a coil antenna surrounding the tube. The coil antenna includes a plurality of turns, and at least one turn is shorted. Selectively shorting one or more turns of the coil antenna helps reduce the inductance of the coil antenna, allowing higher power to be supplied to the coil antenna that covers more processing volume. Higher power supplied to the coil antenna and larger processing volume lead to an improved DRE.

Method and apparatus for gas abatement

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Cupertino, CA, United States of America

David Muquing Hou