Transphorm Technology, Inc.

Transphorm Inc.

David Michael Rhodes

Umesh Kumar Mishra

Rakesh K Lal

Carl Joseph Neufeld

Geetak Gupta

Yifeng Wu

Primit A Parikh

Likun Shen

Sung Hae Yea

Ronald Avrom Barr

Toshihide Kikkawa

Davide Bisi

Mo Wu

John Kirk Gritters

Xiang Liu

Kurt Vernon Smith

James Leroy McKay

An electronic component includes at least three terminals extending from a component package. The component includes a depletion-mode III-N transistor, and an enhancement-mode transistor in the package. A gate electrode of the enhancement-mode transistor is electrically connected to the first terminal, a source electrode of the enhancement-mode transistor and a gate electrode of the depletion-mode III-N transistor are electrically connected to the second terminal, a drain electrode of the enhancement-mode transistor is electrically connected to a source electrode of the depletion-mode III-N transistor, and a drain electrode of the depletion-mode III-N transistor is electrically connected to the third terminal. The drain electrode includes multiple drain pads each sequentially a further distance from the third terminal, where a wire-bond extends from each drain pad to the third terminal, each wire-bond having a length, where a diameter of the longest wire-bond is greater than the diameter of the shortest wire-bond.

III-N devices with improved reliability

An electronic module for a half-bridge circuit includes a base substrate with an insulating layer between a first metal layer and a second metal layer. A trench formed through the first metal layer electrically isolates first, second, and third portions of the first metal layer from one another. A high-side switch includes an enhancement-mode transistor and a depletion-mode transistor. The depletion-mode transistor includes a III-N material structure on an electrically conductive substrate. A drain electrode of the depletion-mode transistor is connected to the first portion, a source electrode of the enhancement-mode transistor is connected to the second portion, a drain electrode of the enhancement-mode transistor is connected to a source electrode of the depletion-mode transistor, a gate electrode of the depletion-mode transistor is connected to the electrically conductive substrate, and the electrically conductive substrate is connected to the second portion.

Module configurations for integrated III-nitride devices

Described herein are lateral III-N (e.g., GaN) devices having a III-N depleting layer. A circuit includes a depletion-mode transistor with a source connected to a drain of an enhancement-mode transistor. The gate of the depletion-mode transistor and the gate of the enhancement-mode transistor are biased at zero volts, and the drain of the depletion-mode transistor is biased at positive voltage to block a current in a forward direction. Then, the bias of the gate of the enhancement-mode transistor is changed to a first voltage greater than the threshold voltage of the enhancement-mode transistor and a first current is allowed to flow through the channel in a forward direction. Then, the bias of the gate of the depletion-mode transistor is changed to a second voltage and a second current is allowed to flow through the channel in a forward direction where the second current is greater than the first current.

N-polar devices including a depleting layer with improved conductivity

Module configurations for integrated III-Nitride devices

A transistor includes a III-N channel layer; a III-N barrier layer on the III-N channel layer; a source contact and a drain contact, the source and drain contacts electrically coupled to the III-N channel layer; an insulator layer on the III-N barrier layer; a gate insulator partially on the insulator layer and partially on the III-N channel layer, the gate insulator including an amorphous AlSiO layer with 0.2&#x3c;x&#x3c;0.8; and a gate electrode over the gate insulator, the gate electrode being positioned between the source and drain contacts.

Enhancement mode III-nitride devices having an Al-SiO gate insulator

A III-N device includes a III-N layer structure including a III-N channel layer, a III-N barrier layer over the III-N channel layer, and a graded III-N layer over the III-N barrier layer having a first side adjacent to the III-N barrier layer and a second side opposite the first side; a first power electrode and a second power electrode; and a gate between the first and second power electrodes, the gate being over the III-N layer structure. A composition of the graded III-N layer is graded so the bandgap of the graded III-N layer adjacent to the first side is greater than the bandgap of the graded III-N layer adjacent to the second side. A region of the graded III-N layer is (i) between the gate and the second power electrode, and (ii) electrically connected to the first power electrode and electrically isolated from the second power electrode.

III-nitride devices including a graded depleting layer

Techniques for improving reliability of III-N devices include holding the III-N devices at a first temperature less than or equal to 30&#xb0; for a first period of time while applying a first gate-source voltage lower than a threshold voltage of the III-N devices and a first drain-source voltage greater than 0.2 times a break down voltage of the III-N devices; and holding the III-N devices at a second temperature greater than the first temperature for a second period of time while applying a second gate-source voltage lower than a threshold voltage of the III-N devices and a second drain-source voltage greater than 0.2 times a breakdown voltage of the III-N devices. After holding the III-N devices at the first and second temperatures, screening the III-N devices based on electrical performance of one or more parameters of the III-N devices.

Conditions for burn-in of high power semiconductors

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Santa Barbara, CA, United States of America

David Michael Rhodes