Applied Materials, Inc.

Alta Devices, Inc.

Elevated Materials US LLC

David Masayuki Ishikawa

Brian Hayes Burrows

Visweswaren Sivaramakrishnan

Joseph Yudovsky

Jeonghoon Oh

Pravin K Narwankar

Jonathan Stuart Frankel

Kaushal Gangakhedkar

Nag B Patibandla

Mingwei Zhu

Lance A Scudder

Charles C Garretson

Yuriy Melnik

Sukti Chatterjee

Ludovic Godet

Hou Tee Ng

Vijay D Parkhe

Wei-Sheng Lei

Alexander N Lerner

Brian J Brown

Arkadii V Samoilov

Thomas H Osterheld

Todd J Egan

Rami Hourani

Jianshe Tang

Benjamin Cherian

Yihwan Kim

Yue Chen

Subramanya P Herle

Jinxin Fu

Craig Metzner

Andreas Schmid

Paul J Steffas

Quoc Truong

Colin Costano Neikirk

Ajey M Joshi

Zihao Yang

Huanbo Zhang

Sumedh Acharya

Garrett Ho Yee Sin

Ezhiylmurugan Rangasamy

Abril Cabreros

Chia-Ling Pai

Niraj Prasad

Julio David Muzquiz

Takashi Kuratomi

David Alexander Britz

Ali Zojaji

Yongmei Chen

Eric Ng

Bahubali S Upadhye

Girish Kumar Gopalakrishnan Nair

Laila S Mattos

Sandip S Desai

Jinyu Lu

Jingyi Yang

Mengnan Zou

Qun Jing

Kent Qiujing Zhao

Vibhas Singh

Marcus Blake Freitas

David Alvarez

Girishkumar Gopalakrishnannair

Alejandro Sevilla

A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated, wherein the rotary vacuum chamber is coupled to the motors, a controller configured to cause the motors to rotate the rotary vacuum chamber about an axial axis of the rotary vacuum chamber such that the particles undergo tumbling agitation, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the rotary vacuum chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.

Rotary reactor for uniform particle coating with thin films

Exemplary processing methods may include translating a lithium film beneath a first showerhead. The methods may include introducing an oxidizer gas through the first showerhead onto the lithium film. The methods may include forming an oxide monolayer on the lithium film. The oxide monolayer may be or include the oxidizer gas adsorbed on the lithium film. The methods may include translating the lithium film beneath a second showerhead after forming the oxide monolayer. The methods may include introducing a carbon source gas through the first showerhead onto the lithium film. The methods may also include converting the oxide monolayer into a carbonate passivation layer through reaction of the oxide monolayer with the carbon source gas.

Lithium metal surface modification using carbonate passivation

Exemplary methods of forming a coating of material on a substrate may include forming a plasma of a first precursor and an oxygen-containing precursor. The first precursor and the oxygen-containing precursor may be provided in a first flow rate ratio. The methods may include depositing a first layer of material on the substrate. While maintaining the plasma, the methods may include adjusting the first flow rate ratio to a second flow rate ratio. The methods may include depositing a second layer of material on the substrate.

Method for forming plasma coating

A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.

Optical device improvement

Metrology systems and processing methods for continuous lithium ion battery (LIB) anode pre-lithiation and solid metal anode protection are provided. In some embodiments, the metrology system integrates at least one complementary non-contact sensor to measure at least one of surface composition, coating thickness, and nanoscale roughness. The metrology system and processing methods can be used to address anode edge quality. The metrology system and methods can facilitate high quality and high yield closed loop anode pre-lithiation and anode protection layer deposition, alloy-type anode pre-lithiation stage control improves LIB coulombic efficiency, and anode coating with pinhole free and electrochemically active protection layers resist dendrite formation.

Web edge metrology

Apparatus and systems for temperature probe integration on pedestal heaters of a processing chamber including a cooling assembly for cooling temperature probes disposed within. Cooling assemblies can be actively water-cooled, passively cooled by fin stacks. Further cooling assemblies include a mechanical arm assembly for lowering or raising the temperature probes.

Apparatus for fiber optic temperature probe in processing chambers

Exemplary backpressure monitoring apparatuses may include a fluid supply source having a fluid port. The backpressure monitoring apparatuses may include a flow control mechanism fluidly coupled with the fluid port. The backpressure monitoring apparatuses may include a delivery tube fluidly coupled with the flow control mechanism and the fluid port. The backpressure monitoring apparatuses may include a pressure differential gauge fluidly coupled with the delivery tube. The pressure differential gauge may include an interface mechanism that is engageable with an outlet of a fluid flow device.

Backpressure monitoring apparatus

Exemplary processing methods of forming an LED structure may include depositing an aluminum nitride layer on a substrate via a physical vapor deposition process. The methods may include heating the aluminum nitride layer to a temperature greater than or about 1500° C. The methods may include forming an ultraviolet light emitting diode structure overlying the aluminum nitride layer utilizing a metal-organic chemical vapor deposition or molecular beam epitaxy.

Methods and systems for UV LED structures

Methods and apparatus for depositing material on a continuous substrate are provided herein. In some embodiments, an apparatus for processing a continuous substrate includes: a first chamber having a first volume; a second chamber having a second volume fluidly coupled to the first volume; and a plurality of process chambers, each having a process volume defining a processing path between the first chamber and the second chamber, wherein the process volume of each process chamber is fluidly coupled to each other, to the first volume, and to the second volume, and wherein the first chamber, the second chamber, and the plurality of process chambers are configured to process a continuous substrate that extends from the first chamber, through the plurality of process chambers, and to the second chamber.

Methods and apparatus for depositing materials on a continuous substrate

A retaining ring for a polishing process is disclosed. The retaining ring includes a body comprising an upper portion and a lower portion, and a sacrificial surface disposed on the lower portion, the sacrificial surface comprising a negative tapered surface having a taper height that is about 0.0003 inches to about 0.00015 inches.

Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes

A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated and coupled to the motors, a controller configured to cause the motors to rotate the chamber in a first direction about an axial axis at a rotation speed sufficient to force the particles to be centrifuged against an inner diameter of the chamber, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.

An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material on the platform, at least one energy source to selectively fuse feed material in a layer on the platform, and an air knife supply unit. The air knife supply unit includes a tube having a plurality of holes spaced along a length of the tube, a multi-fluted helical screw positioned in the tube, a gas inlet configured to supply a gas into an end of the tube with the screw configured to guide the gas from the gas inlet through the tube and out the holes, and a spiral plenum surrounding the tube with the spiral plenum including an inner end to receive gas from the holes and an outer end to deliver the gas over the platform.

Air knife for additive manufacturing

An additive manufacturing apparatus includes a platform, a dispenser to deliver a plurality of successive layers of feed material on the platform, a light source to generate one or more light beams, a first galvo mirror scanner positioned to direct a first light beam onto a topmost layer of the plurality of successive layers, a second galvo mirror scanner positioned to direct a second light beam onto the topmost layer of the plurality of successive layers, and a controller configured to cause the first galvo mirror scanner to direct the first light beam to pre-heat or heat-treat an area of the topmost layer and to cause the second galvo mirror scanner to direct the second light beam to fuse the area of the topmost layer.

Additive manufacturing with multiple mirror scanners

An additive manufacturing system includes a platform to support an object to be fabricated, a dispenser to deliver a plurality of layers of a feed material over the platform, a controller configured to store digital data representing a pre-defined pattern, a laser configured to generate a laser beam to impinge an outermost layer of the feed material and coupled to the controller to fuse the feed material in the pre-defined pattern, and a plurality of independently controllable infrared lamps, each infrared lamp directed to a different section of an outermost layer of the feed material.

Additive manufacturing having energy beam and lamp array

Growing community of inventors

Mountain View, CA, United States of America

David Masayuki Ishikawa