Pneumaticoat Technologies LLC

University of Colorado

David M King

Paul R Lichty

Alan W Weimer

Dean S Dinair

A process for conducting vapor phase deposition is disclosed. The process separates a series of reactions through a sequence of reaction reservoirs. The reactor includes a reactive precursor reservoir beneath a powder reservoir separated by valve means. A reactive precursor is charged into the reactive precursor reservoir and a powder is charged into the powder reservoir. The pressures are adjusted so that the pressure in the reactive precursor reservoir is higher than that of the powder reservoir. The valve means is opened, and the vapor phase reactant fluidized the powder and coats its surface. The powder falls into the reactive precursor reservoir. The apparatus permits vapor phase deposition processes to be performed semi-continuously.

Vapor deposition process for the manufacture of coated particles

The present invention provides various passive electronic components comprising a layer of coated nanoparticles, and methods for producing and using the same. Some of the passive electronic components of the invention include, but are not limited to conductors, resistors, capacitors, piezoelectronic devices, inductors and transformers.

Passive electronics components comprising coated nanoparticles and methods for producing and using the same

A reactor for conducting vapor phase deposition process is disclosed. The reactor includes a reactive precursor reservoir beneath a powder reservoir and separated from it by valve means. A reactive precursor is charged into the reactive precursor reservoir and a powder is charged into the powder reservoir. The pressures are adjusted so that the pressure in the reactive precursor reservoir is higher than that of the powder reservoir. The valve means is opened, and the vapor phase reactant fluidized the powder and coats its surface. The powder falls into the reactive precursor reservoir. The apparatus permits vapor phase deposition processes to be performed semi-continuously.

Semi-continuous vapor deposition process for the manufacture of coated particles

Triethylboron is a useful precursor for depositing films in an atomic layer deposition process. This precursor is useful for depositing boron containing films. Boron containing films are excellent lubricating coatings for zinc powders, improving their flow properties and simplifying powder handling. This makes the coated zinc powders especially useful for battery applications in which a zinc powder is used as an anode material.

Zinc anode battery with boron nitride coated zinc particles

Titanium dioxide particles are coated first with an interstitial coating and then with silicon dioxide or alumina. The coatings are suitably applied via an atomic layer deposition process. The interstitial coating preserves the bright white coloration of the particles after they are coated. The particles therefore can be used as pigments and white fillers in polymers, paints, paper and other applications.

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Longmont, CO, United States of America

David M King